High‐performance HfO 2 /ZrO 2 /IGZO thin‐film transistors deposited using atmospheric pressure plasma jet

2014 ◽  
Vol 50 (23) ◽  
pp. 1747-1749 ◽  
Author(s):  
Chien‐Hung Wu ◽  
Kow‐Ming Chang ◽  
Hsin‐Yu Hsu
Keyword(s):  
Thin Film ◽  
Atmospheric Pressure ◽  
Thin Film Transistors ◽  
High Performance ◽  
Atmospheric Pressure Plasma ◽  
Plasma Jet ◽  
Atmospheric Pressure Plasma Jet ◽  
Pressure Plasma

Investigation of LaAlO 3 /ZrO 2 / a ‐InGaZnO thin‐film transistors using atmospheric pressure plasma jet

2014 ◽  
Vol 50 (9) ◽  
pp. 706-708 ◽  
Author(s):  
Chien‐Hung Wu ◽  
Hau‐Yuan Huang ◽  
Shui‐Jinn Wang ◽  
Kow‐Ming Chang ◽  
Hsin‐Yu Hsu
Keyword(s):  
Thin Film ◽  
Atmospheric Pressure ◽  
Thin Film Transistors ◽  
Atmospheric Pressure Plasma ◽  
Plasma Jet ◽  
Atmospheric Pressure Plasma Jet ◽  
Pressure Plasma

Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition

2009 ◽  
Vol 37 (7) ◽  
pp. 1127-1128 ◽  
Author(s):  
Chun Huang ◽  
Wen-Tung Hsu ◽  
Chi-Hung Liu ◽  
Shin-Yi Wu ◽  
Shih-Hsien Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Plasma Jet ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Atmospheric Pressure Plasma Jet ◽  
Pressure Plasma
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