Investigation of LaAlO
            3
            /ZrO
            2
            /
            a
            ‐InGaZnO thin‐film transistors using atmospheric pressure plasma jet

Chien‐Hung Wu; Hau‐Yuan Huang; Shui‐Jinn Wang; Kow‐Ming Chang; Hsin‐Yu Hsu

doi:10.1049/el.2014.0816

Investigation of LaAlO 3 /ZrO 2 / a ‐InGaZnO thin‐film transistors using atmospheric pressure plasma jet

Electronics Letters ◽

10.1049/el.2014.0816 ◽

2014 ◽

Vol 50 (9) ◽

pp. 706-708 ◽

Cited By ~ 3

Author(s):

Chien‐Hung Wu ◽

Hau‐Yuan Huang ◽

Shui‐Jinn Wang ◽

Kow‐Ming Chang ◽

Hsin‐Yu Hsu

Keyword(s):

Thin Film ◽

Atmospheric Pressure ◽

Thin Film Transistors ◽

Atmospheric Pressure Plasma ◽

Plasma Jet ◽

Atmospheric Pressure Plasma Jet ◽

Pressure Plasma

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Effects of Composition on Electrical Properties of Amorphous In-Ga-Zn-O Thin-Film Transistors Deposited Using Atmospheric Pressure Plasma Jet

10.7567/ssdm.2013.ps-6-24 ◽

2013 ◽

Author(s):

C.H. Wu ◽

K.M. Chang ◽

H.Y. Hsu ◽

C.Y. Chen ◽

S.J. Wang ◽

...

Keyword(s):

Thin Film ◽

Electrical Properties ◽

Atmospheric Pressure ◽

Thin Film Transistors ◽

Atmospheric Pressure Plasma ◽

Plasma Jet ◽

Atmospheric Pressure Plasma Jet ◽

Pressure Plasma

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High‐performance HfO 2 /ZrO 2 /IGZO thin‐film transistors deposited using atmospheric pressure plasma jet

Electronics Letters ◽

10.1049/el.2014.1823 ◽

2014 ◽

Vol 50 (23) ◽

pp. 1747-1749 ◽

Cited By ~ 1

Author(s):

Chien‐Hung Wu ◽

Kow‐Ming Chang ◽

Hsin‐Yu Hsu

Keyword(s):

Thin Film ◽

Atmospheric Pressure ◽

Thin Film Transistors ◽

High Performance ◽

Atmospheric Pressure Plasma ◽

Plasma Jet ◽

Atmospheric Pressure Plasma Jet ◽

Pressure Plasma

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Flow Rate's Influence on Low Temperature Silicon Oxide Deposited by Atmospheric Pressure Plasma Jet for Organic Thin Film Tranisitor Application

ECS Meeting Abstracts ◽

10.1149/ma2010-02/29/1815 ◽

2010 ◽

Keyword(s):

Thin Film ◽

Low Temperature ◽

Atmospheric Pressure ◽

Silicon Oxide ◽

Atmospheric Pressure Plasma ◽

Plasma Jet ◽

Atmospheric Pressure Plasma Jet ◽

Organic Thin Film ◽

Pressure Plasma

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Deposition of Fluorine-Containing Thin Film by Atmospheric Pressure Plasma Jet and Film Surface Structural Transition

Plasma Processes and Polymers ◽

10.1002/ppap.201400109 ◽

2015 ◽

Vol 12 (4) ◽

pp. 362-371 ◽

Cited By ~ 9

Author(s):

Wei-Chun Ma ◽

Chin-Ho Lin ◽

Chun Huang

Keyword(s):

Thin Film ◽

Atmospheric Pressure ◽

Structural Transition ◽

Film Surface ◽

Atmospheric Pressure Plasma ◽

Plasma Jet ◽

Atmospheric Pressure Plasma Jet ◽

Pressure Plasma

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Deposition of organosilicone thin film from hexamethyldisiloxane (HMDSO) with 50 kHz/33 MHz dual-frequency atmospheric-pressure plasma jet

Plasma Science and Technology ◽

10.1088/2058-6272/aa57e4 ◽

2017 ◽

Vol 19 (4) ◽

pp. 045505 ◽

Cited By ~ 6

Author(s):

Jiaojiao LI ◽

Qianghua YUAN ◽

Xiaowei CHANG ◽

Yong WANG ◽

Guiqin YIN ◽

...

Keyword(s):

Thin Film ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Plasma Jet ◽

Atmospheric Pressure Plasma Jet ◽

Dual Frequency ◽

Pressure Plasma

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Superhydrophilization of Surface of Aluminum Thin Film by Atmospheric-Pressure Plasma Jet Irradiation

e-Journal of Surface Science and Nanotechnology ◽

10.1380/ejssnt.2018.27 ◽

2018 ◽

Vol 16 (0) ◽

pp. 27-35

Author(s):

Hiroshi Kuwahata ◽

Yuki Murata ◽

Naoki Hashimoto ◽

Riyuya Segawa

Keyword(s):

Thin Film ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Plasma Jet ◽

Atmospheric Pressure Plasma Jet ◽

Pressure Plasma ◽

Aluminum Thin Film

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Low Temperature Deposition of Cu Thin Film on Polyimide Using RF-driven Atmospheric Pressure Plasma Jet in Nitrogen Atmosphere

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.26.549 ◽

2013 ◽

Vol 26 (4) ◽

pp. 549-554 ◽

Cited By ~ 1

Author(s):

Peng Zhao ◽

Wei Zheng ◽

Yuedong Meng ◽

Masaaki Nagatsu

Keyword(s):

Thin Film ◽

Low Temperature ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Plasma Jet ◽

Nitrogen Atmosphere ◽

Atmospheric Pressure Plasma Jet ◽

Pressure Plasma ◽

Temperature Deposition ◽

Cu Thin Film

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Flow Rate's Influence on Low Temperature Silicon Oxide Deposited by Atmospheric Pressure Plasma Jet for Organic Thin Film Tranisitor Application

ECS Transactions ◽

10.1149/1.3481245 ◽

2019 ◽

Vol 33 (5) ◽

pp. 255-264

Author(s):

Kow-Ming Chang ◽

Shih-Syuan Huang ◽

Chun-Hu Cheng

Keyword(s):

Thin Film ◽

Low Temperature ◽

Atmospheric Pressure ◽

Silicon Oxide ◽

Atmospheric Pressure Plasma ◽

Plasma Jet ◽

Atmospheric Pressure Plasma Jet ◽

Organic Thin Film ◽

Pressure Plasma

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Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition

IEEE Transactions on Plasma Science ◽

10.1109/tps.2008.2011636 ◽

2009 ◽

Vol 37 (7) ◽

pp. 1127-1128 ◽

Cited By ~ 27

Author(s):

Chun Huang ◽

Wen-Tung Hsu ◽

Chi-Hung Liu ◽

Shin-Yi Wu ◽

Shih-Hsien Yang ◽

...

Keyword(s):

Thin Film ◽

Low Temperature ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Plasma Jet ◽

Thin Film Deposition ◽

Film Deposition ◽

Atmospheric Pressure Plasma Jet ◽

Pressure Plasma

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Characterization of an atmospheric pressure plasma jet for surface modification and thin film deposition

The European Physical Journal D ◽

10.1140/epjd/e2010-00245-x ◽

2010 ◽

Vol 60 (3) ◽

pp. 653-660 ◽

Cited By ~ 61

Author(s):

S. Bornholdt ◽

M. Wolter ◽

H. Kersten

Keyword(s):

Thin Film ◽

Surface Modification ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Plasma Jet ◽

Thin Film Deposition ◽

Film Deposition ◽

Atmospheric Pressure Plasma Jet ◽

Pressure Plasma

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