Chemomechanical polishing of gallium arsenide to subnanometre surface finish. An evaluation of hydrogen peroxide and dibromine as reagents
Keyword(s):
Keyword(s):
Oscillatory behavior of the hydrogen peroxide reduction at gallium arsenide semiconductor electrodes
1993 ◽
Vol 97
(28)
◽
pp. 7337-7341
◽
1971 ◽
Vol 29
◽
pp. 346-347
◽
1989 ◽
Vol 47
◽
pp. 372-373
Keyword(s):