ChemInform Abstract: Chemomechanical Polishing of Gallium Arsenide to Subnanometre Surface Finish. An Evaluation of Hydrogen Peroxide and Dibromine as Reagents.
Keyword(s):
Keyword(s):
Oscillatory behavior of the hydrogen peroxide reduction at gallium arsenide semiconductor electrodes
1993 ◽
Vol 97
(28)
◽
pp. 7337-7341
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1971 ◽
Vol 29
◽
pp. 346-347
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1989 ◽
Vol 47
◽
pp. 372-373
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