scholarly journals Atomic layer deposition of superparamagnetic ruthenium-doped iron oxide thin film

RSC Advances ◽  
2021 ◽  
Vol 11 (13) ◽  
pp. 7521-7526
Author(s):  
Aile Tamm ◽  
Aivar Tarre ◽  
Jekaterina Kozlova ◽  
Mihkel Rähn ◽  
Taivo Jõgiaas ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Iron Oxide ◽  
Atomic Layer Deposition ◽  
Coercive Force ◽  
Atomic Layer ◽  
Oxide Thin Film ◽  
Superparamagnetic Behaviour ◽  
Layer Deposition

In atomic layer deposited Ru-doped α-Fe2O3 thin films superparamagnetic behaviour of nanocrystallites is observed with the magnetic coercive force up to 3 kOe.

scholarly journals Reliability enhancement in thin film transistors using Hf and Al co-incorporated ZnO active channels deposited by atomic-layer-deposition

RSC Advances ◽  
2018 ◽  
Vol 8 (60) ◽  
pp. 34215-34223
Author(s):  
So-Yeong Na ◽  
Sung-Min Yoon
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Atomic Layer Deposition ◽  
Thin Film Transistors ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition ◽  
Reliability Enhancement ◽  
Active Channels

Oxide thin films transistors (TFTs) with Hf and Al co-incorporated ZnO active channels prepared by atomic-layer deposition are presented.

Atomic layer deposition of Zn3N2 thin films: growth mechanism and application in thin film transistor

RSC Advances ◽  
2015 ◽  
Vol 5 (29) ◽  
pp. 22712-22717 ◽  
Author(s):  
Soumyadeep Sinha ◽  
Devika Choudhury ◽  
Gopalan Rajaraman ◽  
Shaibal K. Sarkar
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Atomic Layer Deposition ◽  
Growth Mechanism ◽  
Thin Film Transistor ◽  
Atomic Layer ◽  
Dft Study ◽  
Channel Layer ◽  
Layer Deposition

DFT study of the growth mechanism of atomic layer deposited Zn3N2 thin film applied as a channel layer of TFT.

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