Metastable Ta2N3 with highly tunable electrical conductivity via oxygen incorporation

Materials Horizons ◽

10.1039/d1mh00017a ◽

2021 ◽

Author(s):

Chang-Ming Jiang ◽

Laura I. Wagner ◽

Matthew K. Horton ◽

Johanna Eichhorn ◽

Tim Rieth ◽

...

Keyword(s):

Electrical Conductivity ◽

Electronic Structure ◽

Magnetron Sputtering ◽

Crucial Role ◽

Reactive Magnetron Sputtering ◽

Oxygen Impurity ◽

Reactive Magnetron ◽

Oxygen Incorporation

Metastable Ta2N3 with bixbyite structure is directly deposited by reactive magnetron sputtering. Concerted experimental and computational efforts reveal the crucial role of oxygen impurity in both the synthesis and in tuning the electronic structure.

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Role of carbon in the formation of hard Ge1−xCx thin films by reactive magnetron sputtering

Physica B Condensed Matter ◽

10.1016/j.physb.2011.01.077 ◽

2011 ◽

Vol 406 (13) ◽

pp. 2658-2662 ◽

Cited By ~ 8

Author(s):

Chaoquan Hu ◽

Liang Qiao ◽

Hongwei Tian ◽

Xianyi Lu ◽

Qing Jiang ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Understanding the role of energetic particles during the growth of TiO2 thin films by reactive magnetron sputtering through multi-scale Monte Carlo simulations and experimental deposition

Journal of Physics D Applied Physics ◽

10.1088/1361-6463/abd72a ◽

2020 ◽

Author(s):

Romain Tonneau ◽

Pavel Moskovkin ◽

Jérôme Müller ◽

Thomas Melzig ◽

Emile Haye ◽

...

Keyword(s):

Thin Films ◽

Monte Carlo ◽

Magnetron Sputtering ◽

Monte Carlo Simulations ◽

Energetic Particles ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Tio2 Thin Films ◽

Multi Scale

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Effect of background gas environment on oxygen incorporation in TiN films deposited using UHV reactive magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2008.04.014 ◽

2008 ◽

Vol 83 (3) ◽

pp. 467-469 ◽

Cited By ~ 18

Author(s):

Takeo Nakano ◽

Ken'ichiroh Hoshi ◽

Shigeru Baba

Keyword(s):

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Tin Films ◽

Oxygen Incorporation ◽

Gas Environment ◽

Background Gas

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Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment

Journal of Materials Research ◽

10.1557/jmr.2011.428 ◽

2012 ◽

Vol 27 (5) ◽

pp. 765-779 ◽

Cited By ~ 84

Author(s):

Klaus Ellmer ◽

Thomas Welzel

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Energetic Particle ◽

Transparent Conductive Oxide ◽

Ion Bombardment ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Conductive Oxide ◽

Image Position

Abstract

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The role of copper incorporation on the microstructure, mechanical and tribological properties of TiBN-Cu films by reactive magnetron sputtering

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2019.06.053 ◽

2019 ◽

Vol 801 ◽

pp. 112-122 ◽

Cited By ~ 3

Author(s):

Isaac Asempah ◽

Junhua Xu ◽

Lihua Yu ◽

Huang Luo ◽

JinLin Liu ◽

...

Keyword(s):

Magnetron Sputtering ◽

Tribological Properties ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Cu Films ◽

Mechanical And Tribological Properties ◽

Copper Incorporation

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The role of methane in the formation of fullerene-like nanostructure in amorphous carbon film deposited by reactive magnetron sputtering

Diamond and Related Materials ◽

10.1016/j.diamond.2020.108018 ◽

2020 ◽

Vol 109 ◽

pp. 108018

Author(s):

Lulu Pei ◽

Pengfei Ju ◽

Li Ji ◽

Hongxuan Li ◽

Xiaohong Liu ◽

...

Keyword(s):

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Film ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Amorphous Carbon Film

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The role of energetic neutrals in reactive magnetron sputtering of nitrogen-doped austenitic stainless steel coatings

Surface and Coatings Technology ◽

10.1016/s0257-8972(97)00138-2 ◽

1997 ◽

Vol 97 (1-3) ◽

pp. 102-108 ◽

Cited By ~ 23

Author(s):

B.A Shedden ◽

F.N Kaul ◽

M Samandi ◽

B Window

Keyword(s):

Stainless Steel ◽

Austenitic Stainless Steel ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Nitrogen Doped ◽

Stainless Steel Coatings

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Summary Abstract: The role of low‐energy ion bombardment during the growth of epitaxial TiN(100) films by reactive magnetron sputtering: Defect formation and annihilation

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574946 ◽

1987 ◽

Vol 5 (4) ◽

pp. 2162-2164 ◽

Cited By ~ 4

Author(s):

L. Hultman ◽

U. Helmersson ◽

S. A. Barnett ◽

J.‐E. Sundgren ◽

J. E. Greene

Keyword(s):

Magnetron Sputtering ◽

Defect Formation ◽

Ion Bombardment ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Development of preferred orientation in polycrystalline NaCl-structure δ-TaN layers grown by reactive magnetron sputtering: Role of low-energy ion surface interactions

Journal of Applied Physics ◽

10.1063/1.1510558 ◽

2002 ◽

Vol 92 (9) ◽

pp. 5084-5093 ◽

Cited By ~ 67

Author(s):

C.-S. Shin ◽

D. Gall ◽

Y.-W. Kim ◽

N. Hellgren ◽

I. Petrov ◽

...

Keyword(s):

Magnetron Sputtering ◽

Surface Interactions ◽

Preferred Orientation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Role of oxygen flow rate on the structural and optical properties of copper oxide thin films grown by reactive magnetron sputtering

Indian Journal of Physics ◽

10.1007/s12648-015-0745-1 ◽

2015 ◽

Vol 90 (2) ◽

pp. 219-224 ◽

Cited By ~ 3

Author(s):

M Ali ◽

C R Gobinner ◽

D Kekuda

Keyword(s):

Thin Films ◽

Optical Properties ◽

Magnetron Sputtering ◽

Copper Oxide ◽

Flow Rate ◽

Oxygen Flow Rate ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Structural And Optical Properties

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