Unravelling the selective growth mechanism of AlOx with dimethylaluminum isopropoxide as a precursor in atomic layer deposition: a combined theoretical and experimental study

2020 ◽  
Vol 8 (8) ◽  
pp. 4308-4317 ◽  
Author(s):  
Jiaqiang Yang ◽  
Kun Cao ◽  
Quan Hu ◽  
Yanwei Wen ◽  
Xiao Liu ◽  
...  
Keyword(s):  
Experimental Study ◽  
Atomic Layer Deposition ◽  
Growth Mechanism ◽  
Atomic Layer ◽  
Selective Growth ◽  
Layer Deposition ◽  
Nano Catalysts

The selective encapsulation of Pt nano catalysts is achieved to maintain the durability and reactivity.

EFFECT OF OXYGEN BASED FUNCTIONAL GROUPS ON THE NUCLEATION OF TiO2 BY ATOMIC LAYER DEPOSITION: A THEORETICAL AND EXPERIMENTAL STUDY.

2021 ◽  
pp. 124588
Author(s):  
H.A. Borbón-Nuñez ◽  
Jesús Muñiz ◽  
A.G. El Hachimi ◽  
D. Frausto-Silva ◽  
J.L. Gutiérrez-Díaz ◽  
...  
Keyword(s):  
Experimental Study ◽  
Atomic Layer Deposition ◽  
Functional Groups ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Effect Of Oxygen

scholarly journals Area‐Selective Growth of HfS 2 Thin Films via Atomic Layer Deposition at Low Temperature

2020 ◽  
Vol 7 (23) ◽  
pp. 2001493
Author(s):  
Yuanyuan Cao ◽  
Tobias Wähler ◽  
Hyoungwon Park ◽  
Johannes Will ◽  
Annemarie Prihoda ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Selective Growth ◽  
Layer Deposition

Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study

2012 ◽  
Vol 30 (1) ◽  
pp. 01A115 ◽  
Author(s):  
Maarit Kariniemi ◽  
Jaakko Niinistö ◽  
Marko Vehkamäki ◽  
Marianna Kemell ◽  
Mikko Ritala ◽  
...  
Keyword(s):  
Experimental Study ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Deposition Processes

scholarly journals Atomic Layer Deposition of Pt on the Surface Deactivated by Fluorocarbon Implantation: Investigation of the Growth Mechanism

2020 ◽  
Vol 32 (22) ◽  
pp. 9696-9703
Author(s):  
Woo-Hee Kim ◽  
Kihyun Shin ◽  
Bonggeun Shong ◽  
Ludovic Godet ◽  
Stacey F. Bent
Keyword(s):  
Atomic Layer Deposition ◽  
Growth Mechanism ◽  
Atomic Layer ◽  
Layer Deposition

Atomic layer deposition of Zn3N2 thin films: growth mechanism and application in thin film transistor

RSC Advances ◽  
2015 ◽  
Vol 5 (29) ◽  
pp. 22712-22717 ◽  
Author(s):  
Soumyadeep Sinha ◽  
Devika Choudhury ◽  
Gopalan Rajaraman ◽  
Shaibal K. Sarkar
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Atomic Layer Deposition ◽  
Growth Mechanism ◽  
Thin Film Transistor ◽  
Atomic Layer ◽  
Dft Study ◽  
Channel Layer ◽  
Layer Deposition

DFT study of the growth mechanism of atomic layer deposited Zn3N2 thin film applied as a channel layer of TFT.

scholarly journals The Influence of Ozone: Superstoichiometric Oxygen in Atomic Layer Deposition of Fe2O3 Using tert-Butylferrocene and O3

2019 ◽  
Author(s):  
Joel Schneider ◽  
Jon Baker ◽  
Stacey Bent
Keyword(s):  
Iron Oxide ◽  
Atomic Layer Deposition ◽  
Growth Mechanism ◽  
Material Characterization ◽  
Atomic Layer ◽  
Ozone Exposure ◽  
Mechanistic Study ◽  
Domain Orientation ◽  
Layer Deposition

This work demonstrates a mechanistic study of iron oxide deposited by ALD, revealing a growth mechanism involving uptake of superstoichiometric oxygen. Material characterization shows ozone exposure can be used to convert the crystallographic phase and domain orientation of the materials. This mechanism has implications for wider classes of ozone-based ALD processes and can generalize to other systems.<br>

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