scholarly journals Field-plate engineering for high breakdown voltage β-Ga2O3 nanolayer field-effect transistors

RSC Advances ◽  
2019 ◽  
Vol 9 (17) ◽  
pp. 9678-9683 ◽  
Author(s):  
Jinho Bae ◽  
Hyoung Woo Kim ◽  
In Ho Kang ◽  
Jihyun Kim

Field-plated β-Ga2O3 nanoFETs with a breakdown voltage of over 300 V pave a way for downsizing power electronic devices.

2018 ◽  
Vol 112 (12) ◽  
pp. 122102 ◽  
Author(s):  
Jinho Bae ◽  
Hyoung Woo Kim ◽  
In Ho Kang ◽  
Gwangseok Yang ◽  
Jihyun Kim

2013 ◽  
Vol 805-806 ◽  
pp. 948-953
Author(s):  
Cen Kong ◽  
Jian Jun Zhou ◽  
Jin Yu Ni ◽  
Yue Chan Kong ◽  
Tang Sheng Chen

GaN high electronic mobility transistor (HEMT) was fabricated on silicon substrate. A breakdown voltage of 800V was obtained without using field plate technology. The fabrication processes were compatible with the conventional GaN HEMTs fabrication processes. The length between drain and gate (Lgd) has a greater impact on breakdown voltage of the device. A breakdown voltage of 800V with maximum current density of 536 mA/mm was obtained while Lgd was 15μm and the Wg was 100μm. The specific on-state resistance of this devices was 1.75 mΩ·cm2, which was 85 times lower than that of silicon MOSFET with same breakdown voltage. The results establish the foundation of low cost GaN HEMT power electronic devices.


1992 ◽  
Vol 13 (4) ◽  
pp. 192-194 ◽  
Author(s):  
X. Li ◽  
K.F. Longenbach ◽  
Y. Wang ◽  
W.I. Wang

2021 ◽  
Vol 16 (5) ◽  
pp. 738-743
Author(s):  
Chang Hyeon Jo ◽  
Dea Hee Kim ◽  
Hyeong Seong Jo ◽  
O Yong Kwon ◽  
Ey Goo Kang

Power metal-oxide-semiconductor field-effect-transistors (MOSFET) is a high voltage control device that requires high reliability and efficiency and is used to improve efficiency in areas such as renewable energy generators, electric vehicles, power supply unit, converters and motor control. Electrical characteristics of the MOSFET include a Threshold voltage which is a voltage for operating the device, an On-resistance which is a device resistance in an on-state, and a breakdown voltage which means a device withstand voltage. A Super-Junction structure is proposed to design the device with a high breakdown voltage and a low on-resistance. A multi-epitaxial Super-Junction MOSFET forms a Pillar layers by injecting continuously P-type impurity at edge on stacked N-Pillar layer. By forming the Pillar region which is higher doping concentration than N-drift, the on resistance can be reduced. In the forward blocking mode, the depletion layer of the Pillar region is extended to both vertical and horizontal sides, for a high breakdown voltage can be obtained. By using a T-CAD tool which is a process simulator, electrical characteristics of 1,200 V class super-junction MOSFET are analyzed along process variables (pillar lateral length, pillar concentration). When the breakdown voltage of the super junction MOSFET and the Planar MOSFET are equal, On-resistance (based on 10 A) has a gain of approximately 20% by a difference of 0.189 ohm×cm. It is believed that this can contribute to the development of super junction MOSFET with improved reliability and electrical characteristics.


2011 ◽  
Vol 50 (8R) ◽  
pp. 084102 ◽  
Author(s):  
Yoshinori Oshimura ◽  
Takayuki Sugiyama ◽  
Kenichiro Takeda ◽  
Motoaki Iwaya ◽  
Tetsuya Takeuchi ◽  
...  

2008 ◽  
Vol 5 (6) ◽  
pp. 2013-2015 ◽  
Author(s):  
Junxia Shi ◽  
Y. C. Choi ◽  
M. Pophristic ◽  
M. G. Spencer ◽  
L. F. Eastman

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