Atomic layer deposition and electrospinning as membrane surface engineering methods for water treatment: a short review

2020 ◽  
Vol 6 (7) ◽  
pp. 1765-1785
Author(s):  
Jieun Lee ◽  
In S. Kim ◽  
Moon-Hyun Hwang ◽  
Kyu-Jung Chae
Keyword(s):  
Water Treatment ◽  
Atomic Layer Deposition ◽  
Surface Engineering ◽  
Membrane Surface ◽  
Atomic Layer ◽  
Short Review ◽  
Review Article ◽  
Future Perspectives ◽  
Layer Deposition ◽  
Insight Into

This review article provides a summary of the application of ALD and electrospinning in membrane processes for water treatment and insight into the technological challenges and future perspectives for their wider application in the membrane industry.

Atomic scale surface engineering of micro- to nano-sized pharmaceutical particles for drug delivery applications

Nanoscale ◽  
2017 ◽  
Vol 9 (32) ◽  
pp. 11410-11417 ◽  
Author(s):  
D. Zhang ◽  
M. J. Quayle ◽  
G. Petersson ◽  
J. R. van Ommen ◽  
S. Folestad
Keyword(s):  
Drug Delivery ◽  
Atomic Layer Deposition ◽  
Surface Engineering ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Ambient Conditions ◽  
Surface Layers ◽  
Layer Deposition ◽  
Atomic Surface ◽  
Scale Surface

Few atomic surface layers via atomic layer deposition under near ambient conditions significantly altered dissolution and dispersion of pharmaceutical particles.

Nano-laminating of SiO2 and TiO2: Atomic layer deposition as a tool to gain new insight into interfaces

2015 ◽  
Vol 1805 ◽  
Author(s):  
Nicolas Sobel ◽  
Christian Hess
Keyword(s):  
Atomic Layer Deposition ◽  
Photoelectron Spectroscopy ◽  
Atomic Layer ◽  
Laminate Structure ◽  
X Ray ◽  
Layer Deposition ◽  
Insight Into ◽  
Good Agreement ◽  
Si Wafer

ABSTRACTAtomic layer deposition (ALD) was used to deposit a laminate structure of alternating SiO2 and TiO2 monolayers onto a Si wafer. The resulting samples were analyzed in detail by X-ray photoelectron spectroscopy (XPS) revealing a distinct O 1s signature due to the presence of Si-O-Ti species. These findings are in good agreement with those reported for thin ALD films of TiO2 grown on SiO2.

Atomic layer deposition for nanomaterial synthesis and functionalization in energy technology

2017 ◽  
Vol 4 (2) ◽  
pp. 133-154 ◽  
Author(s):  
Xiangbo Meng ◽  
Xinwei Wang ◽  
Dongsheng Geng ◽  
Cagla Ozgit-Akgun ◽  
Nathanaelle Schneider ◽  
...  
Keyword(s):  
Fuel Cells ◽  
Atomic Layer Deposition ◽  
Recent Progress ◽  
Atomic Layer ◽  
Review Article ◽  
Energy Technology ◽  
Energy Technologies ◽  
Nanomaterial Synthesis ◽  
Layer Deposition

This review article summarizes the recent progress of atomic layer deposition (ALD) in energy technologies including rechargeable secondary batteries, fuel cells, photovoltaics, and optoelectronics.

scholarly journals Surface engineering of synthetic nanopores by atomic layer deposition and their applications

2013 ◽  
Vol 7 (4) ◽  
pp. 335-349 ◽  
Author(s):  
Ce-Ming Wang ◽  
De-Lin Kong ◽  
Qiang Chen ◽  
Jian-Ming Xue
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Engineering ◽  
Atomic Layer ◽  
Layer Deposition
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