Synthesis and Surface Engineering of Complex Nanostructures by Atomic Layer Deposition

2007 ◽  
Vol 19 (21) ◽  
pp. 3425-3438 ◽  
Author(s):  
M. Knez ◽  
K. Nielsch ◽  
L. Niinistö
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Engineering ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Complex Nanostructures

Atomic scale surface engineering of micro- to nano-sized pharmaceutical particles for drug delivery applications

Nanoscale ◽  
2017 ◽  
Vol 9 (32) ◽  
pp. 11410-11417 ◽  
Author(s):  
D. Zhang ◽  
M. J. Quayle ◽  
G. Petersson ◽  
J. R. van Ommen ◽  
S. Folestad
Keyword(s):  
Drug Delivery ◽  
Atomic Layer Deposition ◽  
Surface Engineering ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Ambient Conditions ◽  
Surface Layers ◽  
Layer Deposition ◽  
Atomic Surface ◽  
Scale Surface

Few atomic surface layers via atomic layer deposition under near ambient conditions significantly altered dissolution and dispersion of pharmaceutical particles.

Atomic layer deposition and electrospinning as membrane surface engineering methods for water treatment: a short review

2020 ◽  
Vol 6 (7) ◽  
pp. 1765-1785
Author(s):  
Jieun Lee ◽  
In S. Kim ◽  
Moon-Hyun Hwang ◽  
Kyu-Jung Chae
Keyword(s):  
Water Treatment ◽  
Atomic Layer Deposition ◽  
Surface Engineering ◽  
Membrane Surface ◽  
Atomic Layer ◽  
Short Review ◽  
Review Article ◽  
Future Perspectives ◽  
Layer Deposition ◽  
Insight Into

This review article provides a summary of the application of ALD and electrospinning in membrane processes for water treatment and insight into the technological challenges and future perspectives for their wider application in the membrane industry.

scholarly journals Surface engineering of synthetic nanopores by atomic layer deposition and their applications

2013 ◽  
Vol 7 (4) ◽  
pp. 335-349 ◽  
Author(s):  
Ce-Ming Wang ◽  
De-Lin Kong ◽  
Qiang Chen ◽  
Jian-Ming Xue
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Engineering ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Is Poly(methyl methacrylate) (PMMA) a Suitable Substrate for ALD?: A Review

Polymers ◽  
2021 ◽  
Vol 13 (8) ◽  
pp. 1346
Author(s):  
Marta Adriana Forte ◽  
Ricardo Manuel Silva ◽  
Carlos José Tavares ◽  
Rui Ferreira e Silva
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Methyl Methacrylate ◽  
Flexible Electronics ◽  
Surface Engineering ◽  
Chemical Deposition ◽  
Atomic Layer ◽  
Level Control ◽  
Poly Methyl Methacrylate ◽  
Layer Deposition

Poly (methyl methacrylate) (PMMA) is a thermoplastic synthetic polymer, which displays superior characteristics such as transparency, good tensile strength, and processability. Its performance can be improved by surface engineering via the use of functionalized thin film coatings, resulting in its versatility across a host of applications including, energy harvesting, dielectric layers and water purification. Modification of the PMMA surface can be achieved by atomic layer deposition (ALD), a vapor-phase, chemical deposition technique, which permits atomic-level control. However, PMMA presents a challenge for ALD due to its lack of active surface sites, necessary for gas precursor reaction, nucleation, and subsequent growth. The purpose of this review is to discuss the research related to the employment of PMMA as either a substrate, support, or masking layer over a range of ALD thin film growth techniques, namely, thermal, plasma-enhanced, and area-selective atomic layer deposition. It also highlights applications in the selected fields of flexible electronics, biomaterials, sensing, and photocatalysis, and underscores relevant characterization techniques. Further, it concludes with a prospective view of the role of ALD in PMMA processing.

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