Atomically thin semiconducting penta-PdP2 and PdAs2 with ultrahigh carrier mobility

2018 ◽  
Vol 6 (34) ◽  
pp. 9055-9059 ◽  
Author(s):  
Hao Yuan ◽  
Zhenyu Li ◽  
Jinlong Yang

Two dimensional materials with a pentagonal structure and ultra-high carrier mobilities have been designed theoretically.

Nanoscale ◽  
2019 ◽  
Vol 11 (3) ◽  
pp. 1131-1139 ◽  
Author(s):  
Ya-Qian Song ◽  
Jun-Hui Yuan ◽  
Li-Heng Li ◽  
Ming Xu ◽  
Jia-Fu Wang ◽  
...  

Two-dimensional materials with high carrier mobility and tunable magnetism are in high demand for nanoelectronic and spintronic applications.


2015 ◽  
Vol 3 (24) ◽  
pp. 6284-6290 ◽  
Author(s):  
Xi-Bo Li ◽  
Pan Guo ◽  
Yan-Ning Zhang ◽  
Ru-Fang Peng ◽  
Hui Zhang ◽  
...  

Two-dimensional materials with a higher carrier mobility are promising materials for applications in nanoelectronics and photocatalysis.


2021 ◽  
Vol 9 (14) ◽  
pp. 4971-4977
Author(s):  
Mehmet Emin Kilic ◽  
Kwang-Ryeol Lee

Tetrahexagonal AlN: a novel two-dimensional family for photocatalytic water splitting with exceptional mechanical, electronic, and optical properties.


Author(s):  
Kai Ren ◽  
Huabing Shu ◽  
Wenyi Huo ◽  
Zhen Cui ◽  
Jin Yu ◽  
...  

Two-dimensional (2D) materials with moderate bandgap and high carrier mobility are decent for the applications in the optoelectronics. In this work, we present a systematically investigation of the mechanical, electronic...


Nanomaterials ◽  
2019 ◽  
Vol 9 (9) ◽  
pp. 1245 ◽  
Author(s):  
Kun Yang ◽  
Hongxia Liu ◽  
Shulong Wang ◽  
Wei Li ◽  
Tao Han

Transition metal dichalcogenides (TMDCs) have received wide attention as a new generation of semiconductor materials. However, there are still many problems to be solved, such as low carrier mobility, contact characteristics between metal and two-dimensional materials, and complicated fabrication processes. In order to overcome these problems, a large amount of research has been carried out so that the performance of the device has been greatly improved. However, most of these studies are based on complicated fabrication processes which are not conducive to the improvement of integration. In view of this problem, a horizontal-gate monolayer MoS2 transistor based on image force barrier reduction is proposed, in which the gate is in the same plane as the source and drain and comparable to back-gated transistors on-off ratios up to 1 × 104 have been obtained. Subsequently, by combining the Y-Function method (YFM) and the proposed diode equivalent model, it is verified that Schottky barrier height reduction is the main reason giving rise to the observed source-drain current variations. The proposed structure of the device not only provides a new idea for the high integration of two-dimensional devices, but also provides some help for the study of contact characteristics between two-dimensional materials and metals.


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