scholarly journals Atomistic manipulation of reversible oxidation and reduction in Ag with an electron beam

Nanoscale ◽  
2019 ◽  
Vol 11 (22) ◽  
pp. 10756-10762 ◽  
Author(s):  
Huaping Sheng ◽  
He Zheng ◽  
Shuangfeng Jia ◽  
Maria K. Y. Chan ◽  
Tijana Rajh ◽  
...  
Keyword(s):  
Electron Beam ◽  
Atomic Resolution ◽  
Direct Control

Employing electrons for direct control of a nanoscale reaction is highly desirable since it enables fabrication of nanostructures with different properties at atomic resolution and with flexibility of dimensions and location.

Micro-engineered Nanowire Electron Source for Atomic Resolution Imaging

2021 ◽  
Author(s):  
Han Zhang ◽  
Yu Jimbo ◽  
Akira Niwata ◽  
Akihiro Ikeda ◽  
Akira Yasuhara ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Performance ◽  
Low Cost ◽  
High Resolution Electron Microscopy ◽  
Electron Source ◽  
Atomic Resolution ◽  
Angular Deviation ◽  
Resolution Electron ◽  
Emission Volume ◽  
Forming Efficiency

Abstract The size tunability and chemical versatility of nanostructures provide attractive engineering potential to realize an electron source of high brightness and spatial temporal coherence, which is a characteristic ever pursued by high resolution electron microscopy. (1–3) Regardless of the intensive research efforts, electron sources that have ever produced atomic resolution images are still limited to the conventional field emitters based on a bulk W needle. It is due to the lack of fabrication precision for nanostructured sources, that is required to align a nanometric emission volume along a macroscopic emitter axis with sub-degree angular deviation. (4) In this work, we produced a LaB6 nanowire electron source which was micro-engineered to ensure a highly collimated electron beam with perfect lateral and angular alignment. Such electron source was validated by installing in an aberration-corrected transmission electron microscope, where atomic resolution in both broad-beam and probe-forming modes were demonstrated at 60kV beam energy. The recorded un-monochromated 0.20eV electron energy loss spectroscopy (EELS) resolution, together with 20% probe forming efficiency and 0.4% probe current peak-to-peak noise ratio under a wide vacuum range, presented the unique advantages of nanotechnology and promised high performance low-cost electron beam instruments.

Cold Cathode Electron Beam Recrystallization of Soi Films

1987 ◽  
Vol 107 ◽  
Author(s):  
L. R. Thompson ◽  
J. A. Knapp ◽  
C. A. Moore ◽  
G. J. Collins
Keyword(s):  
Electron Beam ◽  
Line Intensity ◽  
Line Source ◽  
Power Level ◽  
Control Procedure ◽  
Cold Cathode ◽  
Direct Control ◽  
Beam System ◽  
Computer Based ◽  
Zone Melt

AbstractA cold cathode line source electron beam system for forming SOI films by zone melt recrystallization is described. Possible advantages gained from using a cold cathode electron beam include the controllability of the beam profile and power level, as well as straight-forward scaling to recrystallization of 6 or 8 inch wafers. A computer-based melt width control procedure incorporating feedback to the line intensity from optical observation of the molten zone is also described. This technique allows direct control and adjustment of the melt zone over widths typically from 1 to 3 mm.

Examining the stability of folded graphene edges against electron beam induced sputtering with atomic resolution

2010 ◽  
Vol 21 (32) ◽  
pp. 325702 ◽  
Author(s):  
Jamie H Warner ◽  
Mark H Rümmeli ◽  
Alicja Bachmatiuk ◽  
Bernd Büchner
Keyword(s):  
Electron Beam ◽  
Atomic Resolution ◽  
The Stability

Atomic-Resolution Imaging in the STEM

1990 ◽  
Vol 48 (1) ◽  
pp. 32-33
Author(s):  
J. Liu
Keyword(s):  
Electron Beam ◽  
Phase Contrast ◽  
Zone Axis ◽  
Atomic Scale ◽  
Atomic Resolution ◽  
Beam Specimen ◽  
Multiple Quantum ◽  
Probe Size ◽  
Imaging Mode ◽  
Resolution Imaging

Scanning transmission electron microscopy (STEM) instruments offer a variety of important imaging and diffraction techniques for characterizing materials and for investigating electron beam specimen interactions. Microdiffraction patterns and electron energy loss spectra can be obtained with a probe size about 1-1.5 nm in diameter. Secondary electron images with a resolution approaching the probe size ( 0.5 nm) can be obtained in STEM instruments. Atomic resolution images can also be obtained with bright-field (BF) imaging mode by phase contrast or with high-angle annular dark-field (HAADF) imaging mode by atomic number contrast. We report here some recent results on high resolution imaging of crystal structures in the STEM.Phase contrast BF STEM lattice fringes can be obtained by placing a detector at any position of the Ronchigram fringe patterns (shown in figure 1a), formed in the diffraction plane with large convergence of the electron beam incident along a principle zone axis of a single crystal. The image interpretation is similar, due to the reciprocity theorem, to that of the conventional HRTEM images. The image contrast depends on defocus, sample thickness and lens aberrations. Figure 1b shows a BF STEM structural image of a GaAs/InAlAs/InGaAs multiple-quantum-well (MQW) crystal projected along the [110] zone axis. This image reveals the interfaces with weak contrast. Although some information about the interfacial structures can be obtained (e.g., interfaces indicated by arrow A seem abrupt while that indicated by B seems diffuse), chemical interpretation at the atomic scale across the interfaces seems unlikely without performing rigorous image simulation.

scholarly journals Analysis of global and site-specific radiation damage in cryo-EM

2018 ◽  
Author(s):  
Johan Hattne ◽  
Dan Shi ◽  
Calina Glynn ◽  
Chih-Te Zee ◽  
Marcus Gallagher-Jones ◽  
...  
Keyword(s):  
Electron Beam ◽  
Radiation Damage ◽  
Disulfide Bonds ◽  
Atomic Resolution ◽  
Proteinase K ◽  
Electron Radiation ◽  
Site Specific ◽  
X Ray ◽  
X Ray Crystallography ◽  
Crystal Electron

SummaryMicro-crystal electron diffraction (MicroED) is an emerging method in cryo-EM for structure determination using nanocrystals. It has been used to solve structures of a diverse set of biomolecules and materials, in some cases to sub-atomic resolution. However, little is known about the damaging effects of the electron beam on samples during such measurements. We assess global and site-specific damage from electron radiation on nanocrystals of proteinase K and of a prion hepta-peptide and find that the dynamics of electron-induced damage follow well-established trends observed in X-ray crystallography. Metal ions are perturbed, disulfide bonds are broken, and acidic side chains are decarboxylated while the diffracted intensities decay exponentially with increasing exposure. A better understanding of radiation damage in MicroED improves our assessment and processing of all types of cryo-EM data.

Electron-beam-stimulated processes at CdS surfaces observed by real-time atomic-resolution electron microscopy

1986 ◽  
Vol 1 (4) ◽  
pp. 560-563 ◽  
Author(s):  
David J. Smith ◽  
Daniel J. Ehrlich
Keyword(s):  
Electron Microscopy ◽  
Electron Beam ◽  
Nucleation And Growth ◽  
Atomic Resolution ◽  
Inelastic Electron ◽  
Electron Collisions ◽  
Resolution Electron ◽  
Electron Stimulated Desorption ◽  
Induced Changes ◽  
Cubic Cds

Electron-beam-induced changes in the structure of partially amorphous CdS surfaces have been observed directly by atomic-resolution electron microscopy. A sequence of atomic rearrangements leading to nucleation and growth of cubic CdS and hexagonal Cd has been documented. Inelastic electron collisions lead to crystallization of overlying amorphous CdS material whereas electron-stimulated desorption of S from the underlying CdS crystal results in precipitation of Cd crystallites at the crystalline/amorphous interface. From 100 to 500 keV the events are almost energy-independent.

scholarly journals Atomic-resolution transmission electron microscopy of electron beam–sensitive crystalline materials

Science ◽  
2018 ◽  
Vol 359 (6376) ◽  
pp. 675-679 ◽  
Author(s):  
Daliang Zhang ◽  
Yihan Zhu ◽  
Lingmei Liu ◽  
Xiangrong Ying ◽  
Chia-En Hsiung ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Electron Beam ◽  
Accurate Determination ◽  
Image Resolution ◽  
Atomic Resolution ◽  
Crystalline Materials ◽  
Hybrid Perovskite ◽  
Transmission Electron ◽  
High Image Resolution

High-resolution imaging of electron beam–sensitive materials is one of the most difficult applications of transmission electron microscopy (TEM). The challenges are manifold, including the acquisition of images with extremely low beam doses, the time-constrained search for crystal zone axes, the precise image alignment, and the accurate determination of the defocus value. We develop a suite of methods to fulfill these requirements and acquire atomic-resolution TEM images of several metal organic frameworks that are generally recognized as highly sensitive to electron beams. The high image resolution allows us to identify individual metal atomic columns, various types of surface termination, and benzene rings in the organic linkers. We also apply our methods to other electron beam–sensitive materials, including the organic-inorganic hybrid perovskite CH3NH3PbBr3.

scholarly journals Electron Beam-Induced Object Excitations at Atomic Resolution - Minimization and Exploitation

2017 ◽  
Vol 23 (S1) ◽  
pp. 1792-1793
Author(s):  
Christian Kisielowski ◽  
H.A. Calderon ◽  
Stig Helveg ◽  
Petra Specht
Keyword(s):  
Electron Beam ◽  
Atomic Resolution
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