Direct electron-beam patterning of transferrable plasmonic gold nanoparticles using a HAuCl4/PVP composite resist

Nanoscale ◽  
2019 ◽  
Vol 11 (3) ◽  
pp. 1245-1252 ◽  
Author(s):  
Kaixi Bi ◽  
Yiqin Chen ◽  
Qiang Wan ◽  
Tuo Ye ◽  
Quan Xiang ◽  
...  
Keyword(s):  
Gold Nanoparticles ◽  
Electron Beam ◽  
Spatial Arrangement ◽  
Electron Beam Patterning

Reliable fabrication of gold nanoparticles with desirable size, geometry and spatial arrangement is essential for plasmonic applications.

Proximity and heating effects during electron-beam patterning of ultraviolet lithography masks

2002 ◽  
Vol 20 (6) ◽  
pp. 3029 ◽  
Author(s):  
B. Lu ◽  
J. R. Wasson ◽  
E. J. Weisbrod ◽  
Z. Masnyj ◽  
P. J. S. Mangat ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ultraviolet Lithography ◽  
Heating Effects ◽  
Electron Beam Patterning

Dendrimer-Scaffold-Based Electron-Beam Patterning of Biomolecules

2006 ◽  
Vol 18 (3) ◽  
pp. 315-319 ◽  
Author(s):  
P. Bhatnagar ◽  
S. S. Mark ◽  
I. Kim ◽  
H. Chen ◽  
B. Schmidt ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Patterning

Direct electron beam patterning of sub-5nm monolayer graphene interconnects

2013 ◽  
Author(s):  
Zhengqing John Qi ◽  
Julio A. Rodríguez-Manzo ◽  
Sung Ju Hong ◽  
Yung Woo Park ◽  
Eric A. Stach ◽  
...  
Keyword(s):  
Electron Beam ◽  
Monolayer Graphene ◽  
Electron Beam Patterning

Limitations of proximity-effect correction for electron-beam patterning of photonic crystals

2004 ◽  
Author(s):  
Robert Wuest ◽  
Christoph Hunziker ◽  
Franck Robin ◽  
Patric Strasser ◽  
Daniel Erni ◽  
...  
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Proximity Effect ◽  
Electron Beam Patterning ◽  
Proximity Effect Correction
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