Atomic-scale etching of hexagonal boron nitride for device integration based on two-dimensional materials
Keyword(s):
We propose the atomic-scale etching of h-BN achieving an etching rate less than 1 nm min−1 for device integration based on 2D materials.
2014 ◽
Vol 70
(a1)
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pp. C510-C510
2013 ◽
Vol 27
(23)
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pp. 1330017
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Keyword(s):
2020 ◽
Vol 12
(14)
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pp. 17055-17061
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Keyword(s):
2012 ◽
Vol 77
◽
pp. 266-269
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