Fabrication of a high-performance thin film polarizer using lyotropic chromonic liquid crystals using a high-resolution nanoscale template

2017 ◽  
Vol 5 (46) ◽  
pp. 12241-12248 ◽  
Author(s):  
Hyuk Jun Kim ◽  
Woo-Bin Jung ◽  
Hyeon Su Jeong ◽  
Hee-Tae Jung

Lyotropic chromonic liquid crystals (LCLCs) have attracted attention for their potential applications as thin-film polarizers.

Author(s):  
K. Ogura ◽  
H. Nishioka ◽  
N. Ikeo ◽  
T. Kanazawa ◽  
J. Teshima

Structural appraisal of thin film magnetic media is very important because their magnetic characters such as magnetic hysteresis and recording behaviors are drastically altered by the grain structure of the film. However, in general, the surface of thin film magnetic media of magnetic recording disk which is process completed is protected by several-nm thick sputtered carbon. Therefore, high-resolution observation of a cross-sectional plane of a disk is strongly required to see the fine structure of the thin film magnetic media. Additionally, observation of the top protection film is also very important in this field.Recently, several different process-completed magnetic disks were examined with a UHR-SEM, the JEOL JSM 890, which consisted of a field emission gun and a high-performance immerse lens. The disks were cut into approximately 10-mm squares, the bottom of these pieces were carved into more than half of the total thickness of the disks, and they were bent. There were many cracks on the bent disks. When these disks were observed with the UHR-SEM, it was very difficult to observe the fine structure of thin film magnetic media which appeared on the cracks, because of a very heavy contamination on the observing area.


2020 ◽  
Vol 4 (10) ◽  
pp. 2990-2994
Author(s):  
Deyang Ji ◽  
Jie Li ◽  
Xiaosong Chen ◽  
Lin Li ◽  
Liqiang Li ◽  
...  

Polystyrene-based masks are fabricated to produce top-contact high-resolution (5 μm) electrodes. With this mask, the mobility of DPA-based thin-film transistors could reach 19.22 cm2 V−1 s−1, which is a new breakthrough for DPA thin-film transistors.


Author(s):  
Duk Young Jeong ◽  
Mohammad Masum Billah ◽  
Abu Bakar Siddik ◽  
Byungju Han ◽  
Yeoungjin Chang ◽  
...  

2015 ◽  
Vol 1 (12) ◽  
pp. 1500155 ◽  
Author(s):  
Rungrot Kitsomboonloha ◽  
Hongki Kang ◽  
Gerd Grau ◽  
William Scheideler ◽  
Vivek Subramanian

2019 ◽  
Vol 7 (1) ◽  
pp. 153-160 ◽  
Author(s):  
Sung Min Lee ◽  
Seung Keun Song ◽  
Seongwon Yoon ◽  
Dae Sung Chung ◽  
Suk Tai Chang

High resolution micropatterning of rGO electrodes based on the dewetting of liquid thin films is presented.


Crystals ◽  
2019 ◽  
Vol 9 (9) ◽  
pp. 470 ◽  
Author(s):  
Guo ◽  
Yan ◽  
Chigrinov ◽  
Zhao ◽  
Tribelsky

Electrooptic modes with fast response and high contrast ratio are highly desirable in modern photonics and displays. Ferroelectric liquid crystals (FLCs) are especially promising for fulfilling these demands by employing photoalignment technology in FLC cells. Three electrooptic modes including surface stabilized FLC (SSFLC), deformed helix ferroelectric (DHF) mode, and electrically suppressed helix (ESH) mode are reviewed with the corresponding electrooptic effects like bi- and multi-stable switching, continuous modulation of grayscale or phase, and high contrast switching. The general operation principles FLC electrooptic modes are described, and then the characteristics of each modes for potential applications are summarized. With the advantages of controllable anchoring energy, the photoalignment provides FLC samples with uniform alignment and high contrast ratio. The fast FLCs with a high resolution and high contrast can be used in the next generation display including field sequential color FLC microdisplays, as well as switchable 2D/3D televisions.


1998 ◽  
Vol 120 (4) ◽  
pp. 765-771 ◽  
Author(s):  
Coda H. T. Pan

Compressible Narrow Groove Analysis, as derived in a companion paper (Pan, 1998), is a model implementation of Thin Film High-Resolution Modeling for gas films. This paper describes the numerical procedure to compute the pressure field in a centered spherical device, which has general design features originally intended for a high performance gas bearing gyroscope (Keating and Pan, 1968). The number of groove patterns is varied to bring out the significance of the local compressibility number. Increased local compressibility, associated with reduced number of groove patterns, causes successive degradation of the pressurization capacity until it is entirely suppressed at 32 groove patterns. Further study is made with reversed rotation to create a high vacuum state in the gas film concurrent with a large compressibility number. The evacuation operation (with reversed rotation) is relatively insensitive to the number of groove patterns, but is highly dependent on the accommodation coefficient. Experience in preparing these examples lends evidence to the robustness of Thin Film High-Resolution Modeling. Trouble free iterative computations are routinely performed for the local Knudsen number in excess of 109 and the effective local compressibility number larger than 100.


Author(s):  
Paul G. Kotula ◽  
C. Barry Carter

Thin-film reactions in ceramic systems are of increasing importance as materials such as oxide superconductors and ferroelectrics are applied in thin-film form. In fact, reactions have been found to occur during the growth of YBa2Cu3O6+x on ZrO2. Additionally, thin-film reactions have also been intentionally initiated for the production of buffer layers for the subsequent growth of high-Tc superconductor thin films. The problem is that the kinetics of ceramic thin-film reactions are not well understood when the reaction layer is very thin; that is, when the rate-limiting step is a phase-boundary reaction as opposed to diffusion of the reactants through the product layer. In this case, the reaction layer is likely to be laterally non-uniform. In the present study, the measurement of thin reaction-product layers is accomplished by first digitally acquiring backscattered-electron images in a high-resolution field-emission scanning electron microscope (FESEM) followed by image analysis. Furthermore, the problem of measuring such small thicknesses (e.g., 20-500nm) over lengths of interfaces longer than 3mm is addressed.


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