Through-silicon via submount for the CuO/Cu2O nanostructured field emission display
A three dimensional (3D) field emission display structure was prepared using CuO/Cu2O composite nanowires (NWs) and a three dimensional through silicon via (3D-TSV) technique.
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1998 ◽
Vol 16
(2)
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pp. 736
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2015 ◽
Vol 9
(8)
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pp. 808-813
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