Growth of single-crystalline cubic structured tin(ii) sulfide (SnS) nanowires by chemical vapor deposition

Devika Mudusu; Koteeswara Reddy Nandanapalli; Sreekantha Reddy Dugasani; Jang Won Kang; Sung Ha Park; Charles W. Tu

doi:10.1039/c7ra06346f

Growth of single-crystalline cubic structured tin(ii) sulfide (SnS) nanowires by chemical vapor deposition

RSC Advances ◽

10.1039/c7ra06346f ◽

2017 ◽

Vol 7 (66) ◽

pp. 41452-41459 ◽

Cited By ~ 11

Author(s):

Devika Mudusu ◽

Koteeswara Reddy Nandanapalli ◽

Sreekantha Reddy Dugasani ◽

Jang Won Kang ◽

Sung Ha Park ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistor ◽

Chemical Properties ◽

Chemical Vapor ◽

Physical And Chemical Properties ◽

Effect Transistor ◽

Physical And Chemical ◽

And Chemical Properties

SnS nanowires with high aspect-ratio were developed by chemical vapor deposition and their physical and chemical properties were explored, along with their field effect transistor characteristics.

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Improvement in the Property of Field Effect Transistor Having the HfO2/Ge Structure Fabricated by Photoassisted Metal Organic Chemical Vapor Deposition with Fluorine Treatment

Japanese Journal of Applied Physics ◽

10.7567/jjap.50.04da11 ◽

2011 ◽

Vol 50 (4S) ◽

pp. 04DA11 ◽

Cited By ~ 2

Author(s):

DongHun Lee ◽

Hideto Imajo ◽

Takeshi Kanashima ◽

Masanori Okuyama

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistor ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Organic ◽

Effect Transistor ◽

Organic Chemical Vapor Deposition

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Performance and Reliability Improvement of HfSiON Field-Effect Transistor with Low Hafnium Concentration Cap Layer Formed by Metal Organic Chemical Vapor Deposition with Diethylsilane

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.879 ◽

2008 ◽

Vol 47 (2) ◽

pp. 879-884 ◽

Cited By ~ 2

Author(s):

Motoyuki Sato ◽

Yasushi Nakasaki ◽

Koji Watanabe ◽

Tomonori Aoyama ◽

Eiji Hasegawa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistor ◽

Chemical Vapor ◽

Organic Chemical ◽

Reliability Improvement ◽

Metal Organic ◽

Effect Transistor ◽

Organic Chemical Vapor Deposition

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$\bf SiO_{2}/InP$ Structure Prepared by Direct Photo-Chemical Vapor Deposition Using Deuterium Lamp and Its Applications to Metal-Oxide-Semiconductor Field-Effect Transistor

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.476 ◽

1995 ◽

Vol 34 (Part 1, No. 2A) ◽

pp. 476-481 ◽

Cited By ~ 2

Author(s):

Shih-Chang Shei ◽

Yan-Kuin Su ◽

Chih-Jen Hwang ◽

Meiso Yokoyama

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistor ◽

Chemical Vapor ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Effect Transistor ◽

Deuterium Lamp

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Selective Detection of Lysozyme Biomarker Utilizing Large Area Chemical Vapor Deposition-Grown Graphene-Based Field-Effect Transistor

Frontiers in Bioengineering and Biotechnology ◽

10.3389/fbioe.2018.00029 ◽

2018 ◽

Vol 6 ◽

Cited By ~ 10

Author(s):

Sujoy Ghosh ◽

Niazul I. Khan ◽

John G. Tsavalas ◽

Edward Song

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistor ◽

Chemical Vapor ◽

Selective Detection ◽

Large Area ◽

Effect Transistor ◽

Grown Graphene

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Fabrication of back-gated SWNT field-effect transistor by laser chemical vapor deposition

10.1117/12.700751 ◽

2007 ◽

Author(s):

J. Shi ◽

Y. S. Zhou ◽

Y. F. Lu ◽

Y. S. Lin ◽

S. H. Liou

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistor ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Effect Transistor

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Fabrication of a Si1-xGexChannel Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) Containing High Ge Fraction Layer by Low-Pressure Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.438 ◽

1993 ◽

Vol 32 (Part 1, No. 1B) ◽

pp. 438-441 ◽

Cited By ~ 35

Author(s):

Kinya Goto ◽

Junichi Murota ◽

Takahiro Maeda ◽

Reiner SchÜtz ◽

Kiyohito Aizawa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistor ◽

Chemical Vapor ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Pressure Chemical ◽

Effect Transistor

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Improvement in the Property of Field Effect Transistor Having the HfO2/Ge Structure Fabricated by Photoassisted Metal Organic Chemical Vapor Deposition with Fluorine Treatment

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.04da11 ◽

2011 ◽

Vol 50 (4) ◽

pp. 04DA11 ◽

Cited By ~ 2

Author(s):

DongHun Lee ◽

Hideto Imajo ◽

Takeshi Kanashima ◽

Masanori Okuyama

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistor ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Organic ◽

Effect Transistor ◽

Organic Chemical Vapor Deposition

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Chemical vapor deposition-assembled graphene field-effect transistor on hexagonal boron nitride

Applied Physics Letters ◽

10.1063/1.3604012 ◽

2011 ◽

Vol 98 (26) ◽

pp. 262103 ◽

Cited By ~ 50

Author(s):

Edwin Kim ◽

Tianhua Yu ◽

Eui Sang Song ◽

Bin Yu

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistor ◽

Hexagonal Boron Nitride ◽

Chemical Vapor ◽

Graphene Field Effect Transistor ◽

Effect Transistor

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Chemical vapor deposition grown graphene DNA field-effect transistor biosensor with gold nanoparticles signal amplification

2016 IEEE 29th International Conference on Micro Electro Mechanical Systems (MEMS) ◽

10.1109/memsys.2016.7421617 ◽

2016 ◽

Cited By ~ 1

Author(s):

Chun-Yu Chan ◽

Feng Yan ◽

Mo Yang

Keyword(s):

Gold Nanoparticles ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Signal Amplification ◽

Field Effect ◽

Field Effect Transistor ◽

Chemical Vapor ◽

Effect Transistor ◽

Grown Graphene

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NiO gate GaN-based enhancement-mode hetrojunction field-effect transistor with extremely low on-resistance using metal organic chemical vapor deposition regrown Ge-doped layer

Japanese Journal of Applied Physics ◽

10.7567/jjap.55.121001 ◽

2016 ◽

Vol 55 (12) ◽

pp. 121001 ◽

Cited By ~ 11

Author(s):

Asamira Suzuki ◽

Songbeak Choe ◽

Yasuhiro Yamada ◽

Nobuyuki Otsuka ◽

Daisuke Ueda

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistor ◽

Chemical Vapor ◽

Organic Chemical ◽

Enhancement Mode ◽

Metal Organic ◽

Effect Transistor ◽

Organic Chemical Vapor Deposition

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