scholarly journals All-gas-phase synthesis of amino-functionalized UiO-66 thin films

2017 ◽  
Vol 46 (48) ◽  
pp. 16983-16992 ◽  
Author(s):  
Kristian Blindheim Lausund ◽  
Veljko Petrovic ◽  
Ola Nilsen
Keyword(s):  
Thin Films ◽  
Gas Phase ◽  
Molecular Layer ◽  
Metal Organic Frameworks ◽  
Molecular Layer Deposition ◽  
Phase Synthesis ◽  
Gas Phase Synthesis ◽  
Layer Deposition ◽  
Metal Organic

Thin films of metal–organic frameworks (MOFs) prepared using all-gas-phase techniques such as atomic/molecular layer deposition (ALD/MLD) are emerging due to their potential for enabling suitable applications.

scholarly journals MOF thin films with bi-aromatic linkers grown by molecular layer deposition

2020 ◽  
Vol 8 (5) ◽  
pp. 2539-2548 ◽  
Author(s):  
Kristian Blindheim Lausund ◽  
Malin Solheim Olsen ◽  
Per-Anders Hansen ◽  
Håkon Valen ◽  
Ola Nilsen
Keyword(s):  
Thin Films ◽  
Molecular Layer ◽  
Metal Organic Frameworks ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Wide Range ◽  
Metal Organic ◽  
Sensor Materials

Thin films of metal–organic frameworks (MOFs) are promising for a wide range of applications including membranes for separations and sensor materials in microelectronics.

scholarly journals Atomic/molecular layer deposition: a direct gas-phase route to crystalline metal–organic framework thin films

2016 ◽  
Vol 52 (6) ◽  
pp. 1139-1142 ◽  
Author(s):  
E. Ahvenniemi ◽  
M. Karppinen
Keyword(s):  
Thin Films ◽  
Gas Phase ◽  
Metal Organic Framework ◽  
Molecular Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Metal Organic ◽  
Substrate Surfaces ◽  
Crystalline Metal ◽  
Organic Framework

Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(ii)terephthalate metal–organic framework (MOF) thin films on various substrate surfaces.

scholarly journals ALD/MLD processes for Mn and Co based hybrid thin films

2016 ◽  
Vol 45 (26) ◽  
pp. 10730-10735 ◽  
Author(s):  
E. Ahvenniemi ◽  
M. Karppinen
Keyword(s):  
Thin Films ◽  
Transition Metal ◽  
Terephthalic Acid ◽  
Molecular Layer ◽  
Molecular Layer Deposition ◽  
Organic Hybrid ◽  
Layer Deposition ◽  
Benzenedicarboxylic Acid ◽  
Hybrid Thin Films ◽  
Metal Organic

New types of transition metal–organic hybrid thin films are fabricated with the emerging atomic/molecular layer deposition (ALD/MLD) technique through sequential gas-surface reactions from Mn(thd)3, Co(thd)2, Co(acac)3 and terephthalic acid (1,4-benzenedicarboxylic acid) precursors.

scholarly journals Composition-tuned metal–organic thin-film structures based on photoswitchable azobenzene by ALD/MLD

2020 ◽  
Vol 49 (32) ◽  
pp. 11310-11316
Author(s):  
Aida Khayyami ◽  
Anish Philip ◽  
Jenna Multia ◽  
Maarit Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Metal Organic

We demonstrate the fabrication of in-situ crystalline thin films of various azobenzene (AZO) based photoresponsive metal–organic structures using the atomic/molecular layer deposition (ALD/MLD) technique.

scholarly journals Atomic/molecular layer deposition of Ni-terephthalate thin films

2021 ◽  
Author(s):  
Anish Philip ◽  
Sami Vasala ◽  
Pieter Glatzel ◽  
Maarit Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Molecular Layer Deposition ◽  
Organic Components ◽  
Layer Deposition ◽  
Metal Organic

Atomic/molecular layer deposition (ALD/MLD) is currently strongly emerging as an intriguing route for novel metal-organic thin-film materials. This approach already covers a variety of metal and organic components, and potential...

scholarly journals On the Use of MOFs and ALD Layers as Nanomembranes for the Enhancement of Gas Sensors Selectivity

Nanomaterials ◽  
2019 ◽  
Vol 9 (11) ◽  
pp. 1552 ◽  
Author(s):  
Weber ◽  
Graniel ◽  
Balme ◽  
Miele ◽  
Bechelany
Keyword(s):  
Thin Films ◽  
Gas Sensors ◽  
Gas Sensing ◽  
Metal Organic Frameworks ◽  
Atomic Layer ◽  
Operational Performance ◽  
Layer Deposition ◽  
Metal Organic ◽  
Further Development ◽  
Different Gases

Improving the selectivity of gas sensors is crucial for their further development. One effective route to enhance this key property of sensors is the use of selective nanomembrane materials. This work aims to present how metal-organic frameworks (MOFs) and thin films prepared by atomic layer deposition (ALD) can be applied as nanomembranes to separate different gases, and hence improve the selectivity of gas sensing devices. First, the fundamentals of the mechanisms and configuration of gas sensors will be given. A selected list of studies will then be presented to illustrate how MOFs and ALD materials can be implemented as nanomembranes and how they can be implemented to improve the operational performance of gas sensing devices. This review comprehensively shows the benefits of these novel selective nanomaterials and opens prospects for the sensing community.

Growth of Hybrid Chiral Thin Films by Molecular Layer Deposition Zinc/Cysteine as a Case Study

2021 ◽  
pp. 2101725
Author(s):  
Reut Yemini ◽  
Shalev Blanga ◽  
Hagit Aviv ◽  
Ilana Perelshtein ◽  
Eti Teblum ◽  
...  
Keyword(s):  
Thin Films ◽  
Molecular Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition

Fabrication of Organic Thin Films for Copper Diffusion Barrier Layers Using Molecular Layer Deposition

2010 ◽  
Vol 1249 ◽  
Author(s):  
Stacey Bent ◽  
Paul William Loscutoff ◽  
Scott Clendenning
Keyword(s):  
Thin Films ◽  
Diffusion Barrier ◽  
Molecular Layer ◽  
Organic Thin Films ◽  
Barrier Properties ◽  
Diffusion Barriers ◽  
Molecular Layer Deposition ◽  
Copper Diffusion ◽  
Barrier Layers ◽  
Layer Deposition

AbstractDevice scaling predicts that copper barrier layers of under 3 nm in thickness will soon be needed in back-end processing for integrated circuits, motivating the development of new barrier layer materials. In this work, nanoscale organic thin films for use as possible copper diffusion barrier layers are deposited by molecular layer deposition (MLD) utilizing a series of self-limiting reactions of organic molecules. MLD can be used to tailor film properties to optimize desirable barrier properties, including density, copper surface adhesion, thermal stability, and low copper diffusion. Three systems are examined as copper diffusion barriers, a polyurea film deposited by the reaction of 1,4-phenylene diisocyanate (PDIC) and ethylenediamine (ED), a polyurea film with a sulfide-modified backbone, and a polythiourea films using a modified coupling chemistry. Following deposition of the MLD films, copper is sputter deposited. The copper diffusion barrier properties of the film are tested through adhesion and annealing tests, including 4-point bend testing and TEM imaging to examine the level of copper penetration. The promise and challenges of MLD-formed organic copper diffusion barriers will be discussed.

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