Room-temperature molecular layer deposition of inorganic-organic hybrid aluminum oxide thin films for preventing spin relaxation of cell inner wall of optically pumped atomic magnetometer

2021 ◽  
Author(s):  
Hiroshi Kumagai ◽  
Shun Takeda ◽  
Ryo Yoshimitsu ◽  
Satoru Kobayashi ◽  
Haruki Ishikawa
Keyword(s):  
Thin Films ◽  
Aluminum Oxide ◽  
Spin Relaxation ◽  
Room Temperature ◽  
Molecular Layer ◽  
Oxide Thin Films ◽  
Optically Pumped ◽  
Molecular Layer Deposition ◽  
Organic Hybrid ◽  
Layer Deposition

scholarly journals ALD/MLD processes for Mn and Co based hybrid thin films

2016 ◽  
Vol 45 (26) ◽  
pp. 10730-10735 ◽  
Author(s):  
E. Ahvenniemi ◽  
M. Karppinen
Keyword(s):  
Thin Films ◽  
Transition Metal ◽  
Terephthalic Acid ◽  
Molecular Layer ◽  
Molecular Layer Deposition ◽  
Organic Hybrid ◽  
Layer Deposition ◽  
Benzenedicarboxylic Acid ◽  
Hybrid Thin Films ◽  
Metal Organic

New types of transition metal–organic hybrid thin films are fabricated with the emerging atomic/molecular layer deposition (ALD/MLD) technique through sequential gas-surface reactions from Mn(thd)3, Co(thd)2, Co(acac)3 and terephthalic acid (1,4-benzenedicarboxylic acid) precursors.

Tailor-made oxide architectures attained by molecularly permeable metal-oxide organic hybrid thin films

2014 ◽  
Vol 50 (65) ◽  
pp. 9176-9178 ◽  
Author(s):  
Debabrata Sarkar ◽  
Dereje Hailu Taffa ◽  
Sergey Ishchuk ◽  
Ori Hazut ◽  
Hagai Cohen ◽  
...  
Keyword(s):  
Thin Films ◽  
Metal Oxide ◽  
Electronic Structures ◽  
Molecular Layer ◽  
Solution Treatment ◽  
Molecular Layer Deposition ◽  
Organic Hybrid ◽  
Layer Deposition ◽  
Hybrid Thin Films

Tailor-made metal oxide (MO) thin films with controlled compositions, electronic structures, and architectures are obtained via molecular layer deposition (MLD) and solution treatment.

scholarly journals ALD/MLD fabrication of luminescent Eu-organic hybrid thin films using different aromatic carboxylic acid components with N and O donors

RSC Advances ◽  
2016 ◽  
Vol 6 (105) ◽  
pp. 103412-103417 ◽  
Author(s):  
Z. Giedraityte ◽  
L.-S. Johansson ◽  
M. Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Carboxylic Acid ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Aromatic Carboxylic Acid ◽  
Molecular Layer Deposition ◽  
Organic Hybrid ◽  
Layer Deposition ◽  
Hybrid Thin Films

Atomic/molecular layer deposition (ALD/MLD) processes based on Eu(thd)3 and three different aromatic organic acids with O and N donors as precursors are systematically investigated for the growth of Eu-based inorganic–organic thin-film phosphors.

Growth of Hybrid Chiral Thin Films by Molecular Layer Deposition Zinc/Cysteine as a Case Study

2021 ◽  
pp. 2101725
Author(s):  
Reut Yemini ◽  
Shalev Blanga ◽  
Hagit Aviv ◽  
Ilana Perelshtein ◽  
Eti Teblum ◽  
...  
Keyword(s):  
Thin Films ◽  
Molecular Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition

scholarly journals MOF thin films with bi-aromatic linkers grown by molecular layer deposition

2020 ◽  
Vol 8 (5) ◽  
pp. 2539-2548 ◽  
Author(s):  
Kristian Blindheim Lausund ◽  
Malin Solheim Olsen ◽  
Per-Anders Hansen ◽  
Håkon Valen ◽  
Ola Nilsen
Keyword(s):  
Thin Films ◽  
Molecular Layer ◽  
Metal Organic Frameworks ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Wide Range ◽  
Metal Organic ◽  
Sensor Materials

Thin films of metal–organic frameworks (MOFs) are promising for a wide range of applications including membranes for separations and sensor materials in microelectronics.

scholarly journals Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films

2019 ◽  
Vol 37 (4) ◽  
pp. 040901 ◽  
Author(s):  
Fatemeh S. M. Hashemi ◽  
LiAo Cao ◽  
Felix Mattelaer ◽  
Timo Sajavaara ◽  
J. Ruud van Ommen ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Aluminum Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition
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