scholarly journals Thermal stability of Mg2Si0.4Sn0.6 in inert gases and atomic-layer-deposited Al2O3 thin film as a protective coating

2016 ◽  
Vol 4 (45) ◽  
pp. 17726-17731 ◽  
Author(s):  
Libin Zhang ◽  
Xi Chen ◽  
Yinglu Tang ◽  
Li Shi ◽  
G. Jeffrey Snyder ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Thermoelectric Properties ◽  
Protective Coating ◽  
Atomic Layer ◽  
Inert Gases ◽  
Thermal Stability Of ◽  
Al2o3 Thin Film

The structure and thermoelectric properties of Mg2Si0.4Sn0.6 are unstable above 700 K. We demonstrated atomic-layer-deposited Al2O3 as a protective coating to address this problem.

Thermal Stability of the SrFeO2.5+x (0.4

2007 ◽  
Vol 13 (S02) ◽  
Author(s):  
D Wang ◽  
J Tunney ◽  
X Du ◽  
M Post ◽  
R Gauvin
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Film System ◽  
Thin Film System ◽  
Thermal Stability Of ◽  
Al2o3 Thin Film

Thermal Stability of Atomic Layer Deposited Zr:Al Mixed Oxide Thin Films: An in Situ Transmission Electron Microscopy Study

2005 ◽  
Vol 20 (7) ◽  
pp. 1741-1750
Author(s):  
L.C. Nistor ◽  
O. Richard ◽  
C. Zhao ◽  
H. Bender ◽  
G. Van Tendeloo
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Thin Films ◽  
Thermal Stability ◽  
Transmission Electron Microscopy ◽  
Atomic Layer ◽  
Silicon Surfaces ◽  
Transmission Electron ◽  
Thermal Stability Of

The thermal stability of amorphous Zr:Al mixed oxide films of different composition, produced on (001) silicon wafers by the atomic layer deposition method is studied by transmission electron microscopy during in situ heating experiments. The temperatures at which phase separation and crystallization occur are composition dependent. The crystallization of thick films (55–70 nm), deposited on HF-treated silicon surfaces covered with a 15 cycles Al2O3 layer, results in the formation of cubic ZrO2 and cubic γ–Al2O3. In very thin films (5 nm), deposited on silicon surfaces covered with a 0.5 nm SiO2 thin film, the formation of tetragonal zirconium disilicide (ZrSi2) is observed in the microscope vacuum, at temperatures above 900 °C. This effect depends on the thickness of the as deposited thin film.

Enhancement in thermal stability of atomic layer deposited HfO2 films by using top Hf metal layer

2007 ◽  
Vol 84 (9-10) ◽  
pp. 2226-2229 ◽  
Author(s):  
Tae Joo Park ◽  
Jeong Hwan Kim ◽  
Jae Hyuck Jang ◽  
Minha Seo ◽  
Kwang Duk Na ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Metal Layer ◽  
Atomic Layer ◽  
Thermal Stability Of

Thermal stability of atomic-layer-deposited ultra-thin niobium oxide film on Si (100)

2011 ◽  
Vol 257 (16) ◽  
pp. 7305-7309 ◽  
Author(s):  
Yue Huang ◽  
Yan Xu ◽  
Shi-Jin Ding ◽  
Hong-Liang Lu ◽  
Qing-Qing Sun ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Oxide Film ◽  
Niobium Oxide ◽  
Atomic Layer ◽  
Thermal Stability Of

Thermal stability of PECVD W-B-N thin film as a diffusion barrier

1997 ◽  
Author(s):  
YongTae Kim ◽  
Dong J. Kim ◽  
Chang W. Lee ◽  
Jong-Wan Park
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Diffusion Barrier ◽  
Thermal Stability Of

Intrinsic Thermal Stability of Anisotropic Thin-Film Superconductors

1990 ◽  
Vol 112 (1) ◽  
pp. 10-15 ◽  
Author(s):  
M. I. Flik ◽  
C. L. Tien
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Stability Criterion ◽  
High Temperature Superconductors ◽  
Stability Criteria ◽  
Anisotropic Thermal Conductivity ◽  
Operating Current ◽  
Released Energy ◽  
The Stability ◽  
Thermal Stability Of

Intrinsic thermal stability denotes a situation where a superconductor can carry the operating current without resistance at all times after the occurrence of a localized release of thermal energy. This novel stability criterion is different from the cryogenic stability criteria for magnets and has particular relevance to thin-film superconductors. Crystals of ceramic high-temperature superconductors are likely to exhibit anisotropic thermal conductivity. The resultant anisotropy of highly oriented films of superconductors greatly influences their thermal stability. This work presents an analysis for the maximum operating current density that ensures intrinsic stability. The stability criterion depends on the amount of released energy, the Biot number, the aspect ratio, and the ratio of the thermal conductivities in the plane of the film and normal to it.

Thermal stability of MgO film on Si grown by atomic layer deposition using Mg(EtCp)2 and H2O

2021 ◽  
Author(s):  
Changyu Park ◽  
Changmin Lee ◽  
Woohui Lee ◽  
Jehoon Lee ◽  
Jinyong Kim ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Thermal Stability Of

Improving the stabilities of organic solar cells via employing a mixed cathode buffer layer

2021 ◽  
Vol 95 (3) ◽  
pp. 30201
Author(s):  
Xi Guan ◽  
Yufei Wang ◽  
Shang Feng ◽  
Jidong Zhang ◽  
Qingqing Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Solar Cells ◽  
Mixed Layer ◽  
Organic Solar Cells ◽  
Buffer Layers ◽  
Commercial Development ◽  
Conversion Efficiencies ◽  
Thermal Stability Of ◽  
Cathode Buffer Layers

Organic solar cells (OSCs) have been fabricated using cathode buffer layers based on bathocuproine (BCP) and 4,4'-N,N'-dicarbazole-biphenyl (CBP). It is found that despite nearly same power conversion efficiencies, the bilayer of BCP/CBP shows increased thermal stability of device than the monolayer of BCP, mostly because upper CBP thin film stabilizes under BCP thin film. The mixed layer of BCP:CBP gives slightly decreased efficiency than BCP and BCP/CBP, mostly because the electron mobility of the OSC using BCP:CBP is decreased than those using BCP and BCP/CBP. However, the BCP:CBP increases thermal stability of device than BCP and BCP/CBP, ascribed to that the BCP and CBP effectively inhibit reciprocal tendencies of crystallizations in the mixed layer. Moreover, the BCP:CBP improves the light stability of device than the BCP and BCP/CBP, because the energy transfer from BCP to CBP in in the mixed layer effectively decelerates the photodegradation of BCP. We provide a facial method to improve the stabilities of cathode buffer layers against heat and light, beneficial to the commercial development of OSCs.

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