In situ investigation of mesoporous silicon oxidation kinetics using infrared emittance spectroscopy
2016 ◽
Vol 18
(27)
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pp. 18201-18208
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The kinetics of mesoporous silicon oxidation is investigated by means of infrared emittance measurements. The chemical mechanisms are put in perspective with temperature.
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2012 ◽
Vol 523
◽
pp. 107-112
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2003 ◽
Vol 5
(11)
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pp. 2283
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