scholarly journals Few- and multi-layer graphene on carbon fibers: synthesis and application

RSC Advances ◽  
2015 ◽  
Vol 5 (99) ◽  
pp. 81266-81274 ◽  
Author(s):  
F. Ghaemi ◽  
R. Yunus ◽  
A. Ahmadian ◽  
F. Ismail ◽  
M. A. M. Salleh ◽  
...  

In the current study, we investigated the influences of chemical vapor deposition parameters on the formation of uniform structures of few- and multi-layer graphene (FLG and MLG) as a coating phase on carbon fiber (CF).

2001 ◽  
Vol 11 (PR3) ◽  
pp. Pr3-885-Pr3-892 ◽  
Author(s):  
N. Popovska ◽  
S. Schmidt ◽  
E. Edelmann ◽  
V. K. Wunder ◽  
H. Gerhard ◽  
...  

RSC Advances ◽  
2021 ◽  
Vol 11 (30) ◽  
pp. 18493-18499
Author(s):  
Sergio Sánchez-Martín ◽  
S. M. Olaizola ◽  
E. Castaño ◽  
E. Urionabarrenetxea ◽  
G. G. Mandayo ◽  
...  

Impact of deposition parameters, microstructure and growth kinetics analysis of ZnO grown by Aerosol-assisted Chemical Vapor Deposition (AACVD).


2012 ◽  
Vol 455-456 ◽  
pp. 935-938
Author(s):  
Hai Quan Wang

- TiC/C composite fibers were prepared by vapor phase titanizing of the regular carbon fibers via chemical vapor deposition (CVD). The carbon fibers were titanized from the surface of the fiber to the core. Scanning electron microscope (SEM) and X-ray diffraction (XRD) were applied to characterize the morphology and structure of the TiC/C composite fibers. The influences of CVD reaction conditions such as temperature and reaction time on the TiC particle size and the thickness of the deposited layer were investigated. Higher temperature and longer time resulted in the growth of bigger size of the TiC crystal particles, and the particle uniformity was also decreased.


2018 ◽  
Vol 21 (5) ◽  
pp. 1800730
Author(s):  
Daejong Kim ◽  
Jangwon Han ◽  
Chan Park ◽  
Hyeon‐Geun Lee ◽  
Ji Yeon Park ◽  
...  

RSC Advances ◽  
2015 ◽  
Vol 5 (55) ◽  
pp. 44142-44148 ◽  
Author(s):  
Jun Pu ◽  
Lei Tang ◽  
Chaowei Li ◽  
Taotao Li ◽  
Lin Ling ◽  
...  

The facile and scalable technique is demonstrated, which grow graphene with controllable layers on copper foil substrates using the etching effect of H2 in atmospheric pressure chemical vapor deposition (APCVD).


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