scholarly journals Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer

Nanoscale ◽  
2015 ◽  
Vol 7 (15) ◽  
pp. 6712-6721 ◽  
Author(s):  
Cian Cummins ◽  
Anushka Gangnaik ◽  
Roisin A. Kelly ◽  
Dipu Borah ◽  
John O'Connell ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Metal Oxide ◽  
Self Assembly ◽  
Pattern Transfer

A strategy combining graphoepitaxy and a metal oxide enhanced PS-b-P4VP BCP is utilized for generating aligned Si nanofins with 10 nm feature sizes.

Chain-like nanostructures from anisotropic self-assembly of semiconducting metal oxide nanoparticles with a block copolymer

2012 ◽  
Vol 48 (90) ◽  
pp. 11115 ◽  
Author(s):  
Junzheng Wang ◽  
Suminto Winardi ◽  
Ayae Sugawara-Narutaki ◽  
Akihito Kumamoto ◽  
Tetsuya Tohei ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Metal Oxide ◽  
Self Assembly ◽  
Metal Oxide Nanoparticles ◽  
Oxide Nanoparticles ◽  
Semiconducting Metal Oxide

Carbohydrate-based block copolymer systems: directed self-assembly for nanolithography applications

Soft Matter ◽  
2017 ◽  
Vol 13 (40) ◽  
pp. 7406-7411 ◽  
Author(s):  
I. Otsuka ◽  
N. Nilsson ◽  
D. B. Suyatin ◽  
I. Maximov ◽  
R. Borsali
Keyword(s):  
Block Copolymer ◽  
Block Copolymers ◽  
Self Assembly ◽  
Pattern Transfer ◽  
Regular Structures

Self-assembly of block copolymers (BCPs) provides an attractive nanolithography approach, which looks especially promising for fabrication of regular structures with characteristic sizes below 10 nm. Nevertheless, directed self-assembly (DSA) and pattern transfer for BCPs with such small features remain to be a challenge.

Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae

ACS Nano ◽  
2017 ◽  
Vol 11 (8) ◽  
pp. 7656-7665 ◽  
Author(s):  
Austin P. Lane ◽  
XiaoMin Yang ◽  
Michael J. Maher ◽  
Gregory Blachut ◽  
Yusuke Asano ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Pattern Transfer

Morphology, directed self-assembly and pattern transfer from a high molecular weight polystyrene-block-poly(dimethylsiloxane) block copolymer film

2017 ◽  
Vol 28 (14) ◽  
pp. 145301 ◽  
Author(s):  
Li-Chen Cheng ◽  
Wubin Bai ◽  
Eduardo Fernandez Martin ◽  
Kun-Hua Tu ◽  
Konstantinos Ntetsikas ◽  
...  
Keyword(s):  
Molecular Weight ◽  
Block Copolymer ◽  
High Molecular Weight ◽  
Self Assembly ◽  
Copolymer Film ◽  
Pattern Transfer

Pattern formation of metal–oxide hybrid nanostructures via the self-assembly of di-block copolymer blends

Nanoscale ◽  
2019 ◽  
Vol 11 (40) ◽  
pp. 18559-18567 ◽  
Author(s):  
Dae Soo Jung ◽  
Jiwon Bang ◽  
Tae Wan Park ◽  
Seung Hyup Lee ◽  
Yun Kyung Jung ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Pattern Formation ◽  
Metal Oxide ◽  
Self Assembly ◽  
Microphase Separation ◽  
Pattern Generation ◽  
Hybrid Nanostructures ◽  
The Self ◽  
Unusual Pattern ◽  
Copolymer Blends

Unusual pattern generation of hybrid nanostructures can be achieved via the microphase separation of blended di-BCPs. We present a useful method which is capable of forming uniform hybridized BCP patterns consisting of metal and nonmetal materials.

Pattern Transfer of 23-Nm-Diameter Block Copolymer Self-Assembled Nanodots Using CF4 Etching with Carbon Hard Mask (CHM) as Mask

2013 ◽  
Vol 737 ◽  
pp. 133-136 ◽  
Author(s):  
Miftakhul Huda ◽  
Jing Liu ◽  
Zulfakri bin Mohamad ◽  
You Yin ◽  
Sumio Hosaka
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Pattern Transfer ◽  
Promising Alternative ◽  
Hard Mask ◽  
Dimethyl Siloxane ◽  
Assembly Technique ◽  
Self Assembled ◽  
Ultrahigh Density ◽  
Potential Use

The self-assembly of block copolymer (BCP) has demonstrated as promising alternative technology to overcome the limitation of conventional lithography owing to its ability in forming nanostructure with size 3-100 nm. In this study, we investigated a technique to transfer self-assembled nanodots of Poly(styrene-b-dimethyl siloxane) (PS-PDMS) BCP to Si. The pattern transfer of PS-PDMS nanodots with the pitch of 33 nm and the diameter of 23 nm using CF4 etching with Carbon Hard Mask (CHM) as Mask is demonstrated. Si nanopillar with height of 51 nm was fabricated. This result improves the potential use of PS-PDMS BCP self-assembly technique for fabrication nano-electronic devices, such as quantum dot solar cell and ultrahigh density of magnetic recording.

The Self-Assembly of an Amphiphilic Block Copolymer: A Dissipative Particle Dynamics Study

2005 ◽  
Vol 42 (3) ◽  
pp. 180-183 ◽  
Author(s):  
S. G. Schulz ◽  
U. Frieske ◽  
H. Kuhn ◽  
G. Schmid ◽  
F. Müller ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Dissipative Particle Dynamics ◽  
Particle Dynamics ◽  
The Self ◽  
Amphiphilic Block Copolymer

scholarly journals Metal Oxide-Related Dendritic Structures: Self-Assembly and Applications for Sensor, Catalysis, Energy Conversion and Beyond

Nanomaterials ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 1686
Author(s):  
Ruohong Sui ◽  
Paul A. Charpentier ◽  
Robert A. Marriott
Keyword(s):  
Metal Oxide ◽  
Energy Conversion ◽  
Self Assembly ◽  
Hierarchical Structures ◽  
The Self ◽  
Assembly Process ◽  
Electronic Noses ◽  
Dendritic Nanostructures ◽  
Energy Conversion And Storage ◽  
The Aesthetic

In the past two decades, we have learned a great deal about self-assembly of dendritic metal oxide structures, partially inspired by the nanostructures mimicking the aesthetic hierarchical structures of ferns and corals. The self-assembly process involves either anisotropic polycondensation or molecular recognition mechanisms. The major driving force for research in this field is due to the wide variety of applications in addition to the unique structures and properties of these dendritic nanostructures. Our purpose of this minireview is twofold: (1) to showcase what we have learned so far about how the self-assembly process occurs; and (2) to encourage people to use this type of material for drug delivery, renewable energy conversion and storage, biomaterials, and electronic noses.

Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

2021 ◽  
Vol 13 (4) ◽  
pp. 5772-5781
Author(s):  
Dong Hyup Kim ◽  
Ahram Suh ◽  
Geonhyeong Park ◽  
Dong Ki Yoon ◽  
So Youn Kim
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly
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