Trap density probing on top-gate MoS2nanosheet field-effect transistors by photo-excited charge collection spectroscopy

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Insulated gate n-channel enhancement mode InGaAs field effect transistors with the GdScO 3 high-k dielectric have been fabricated and studied. The low frequency noise was high indicating a high interface density of traps. Trap density and its dependence on the gate voltage have been extracted from the noise and conductance measurements.


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