scholarly journals Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1−xN thin films at low temperatures

2014 ◽  
Vol 2 (12) ◽  
pp. 2123-2136 ◽  
Author(s):  
Cagla Ozgit-Akgun ◽  
Eda Goldenberg ◽  
Ali Kemal Okyay ◽  
Necmi Biyikli
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Hollow Cathode ◽  
Low Temperatures ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Cathode Plasma ◽  
Temperature Plasma ◽  
Layer Deposition

The authors report on the use of hollow cathode plasma for low-temperature plasma-assisted atomic layer deposition (PA-ALD) of crystalline AlN, GaN and AlxGa1−xN thin films with low impurity concentrations.

scholarly journals Low-temperature grown wurtzite InxGa1−xN thin films via hollow cathode plasma-assisted atomic layer deposition

2015 ◽  
Vol 3 (37) ◽  
pp. 9620-9630 ◽  
Author(s):  
Ali Haider ◽  
Seda Kizir ◽  
Cagla Ozgit-Akgun ◽  
Eda Goldenberg ◽  
Shahid Ali Leghari ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Band Gap ◽  
Hollow Cathode ◽  
Optical Band Gap ◽  
Atomic Layer ◽  
Cathode Plasma ◽  
Layer Deposition ◽  
Wide Range

Hollow cathode plasma assisted atomic layer deposited InxGa1−xN alloys show successful tunability of the optical band gap by changing the In concentration in a wide range.

Low-temperature plasma enhanced atomic layer deposition of large area HfS2 nanocrystal thin films

2020 ◽  
Vol 29 (3) ◽  
pp. 038102 ◽  
Author(s):  
Ailing Chang ◽  
Yichen Mao ◽  
Zhiwei Huang ◽  
Haiyang Hong ◽  
Jianfang Xu ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Large Area ◽  
Temperature Plasma ◽  
Layer Deposition

scholarly journals Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures

2015 ◽  
Vol 12 (4-5) ◽  
pp. 394-398 ◽  
Author(s):  
Cagla Ozgit-Akgun ◽  
Eda Goldenberg ◽  
Sami Bolat ◽  
Burak Tekcan ◽  
Fatma Kayaci ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Hollow Cathode ◽  
Atomic Layer ◽  
Cathode Plasma ◽  
Layer Deposition

scholarly journals Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

2019 ◽  
Vol 25 (4) ◽  
pp. 233-242 ◽  
Author(s):  
Stephen E. Potts ◽  
Luc R. Van den Elzen ◽  
Gijs Dingemans ◽  
Erik Langereis ◽  
Wytze Keuning ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Oxide Thin Films ◽  
Temperature Plasma ◽  
Metal Oxide Thin Films ◽  
Layer Deposition

scholarly journals Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

2010 ◽  
Vol 157 (7) ◽  
pp. P66 ◽  
Author(s):  
S. E. Potts ◽  
W. Keuning ◽  
E. Langereis ◽  
G. Dingemans ◽  
M. C. M. van de Sanden ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Oxide Thin Films ◽  
Temperature Plasma ◽  
Metal Oxide Thin Films ◽  
Layer Deposition

A Selective BP/Si Contact Formed by Low-Temperature Plasma-Enhanced Atomic Layer Deposition

2021 ◽  
Vol 47 (1) ◽  
pp. 96-98
Author(s):  
A. S. Gudovskikh ◽  
D. A. Kudryashov ◽  
A. I. Baranov ◽  
A. V. Uvarov ◽  
I. A. Morozov
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Layer Deposition

scholarly journals Long-range ordered vertical III-nitride nano-cylinder arrays via plasma-assisted atomic layer deposition

2018 ◽  
Vol 6 (24) ◽  
pp. 6471-6482 ◽  
Author(s):  
Ali Haider ◽  
Petro Deminskyi ◽  
Mehmet Yilmaz ◽  
Kholoud Elmabruk ◽  
Ibrahim Yilmaz ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Anodized Aluminum ◽  
Temperature Plasma ◽  
Anodized Aluminum Oxide ◽  
Si Substrates ◽  
Cylinder Arrays ◽  
Layer Deposition

In this work, we demonstrate vertical GaN, AlN, and InN hollow nano-cylindrical arrays (HNCs) grown on Si substrates using anodized aluminum oxide (AAO) membrane templated low-temperature plasma-assisted atomic layer deposition (PA-ALD).

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