Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
2015 ◽
Vol 12
(4-5)
◽
pp. 394-398
◽
Keyword(s):
2014 ◽
Vol 2
(12)
◽
pp. 2123-2136
◽
2014 ◽
Vol 32
(3)
◽
pp. 031508
◽
Keyword(s):
2020 ◽
Vol 38
(6)
◽
pp. 062407
Keyword(s):
2021 ◽
Vol 39
(4)
◽
pp. 042403
Keyword(s):
Keyword(s):
2016 ◽
Vol 31
(7)
◽
pp. 075003
◽
2015 ◽
Vol 33
(1)
◽
pp. 01A143
◽
Keyword(s):