Polymer nanostructures in sub-micron lithographically defined channels: film-thickness effects on structural alignment of a small feature size polystyrene–polyisoprene–polystyrene block copolymer

Soft Matter ◽  
2007 ◽  
Vol 3 (7) ◽  
pp. 916-921 ◽  
Author(s):  
Thomas G. Fitzgerald ◽  
Francesca Borsetto ◽  
John M. O'Callaghan ◽  
Barbara Kosmala ◽  
Justin D. Holmes ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Film Thickness ◽  
Structural Alignment ◽  
Feature Size ◽  
Polymer Nanostructures ◽  
Small Feature

scholarly journals Understanding Film Thickness‐Dependent Block Copolymer Self‐Assembly by Controlled Polymer Dewetting on Prepatterned Surfaces

2019 ◽  
Vol 7 (1) ◽  
pp. 1901605 ◽  
Author(s):  
Katharina Brassat ◽  
Daniel Kool ◽  
Colin G. A. Nallet ◽  
Jörg K. N. Lindner
Keyword(s):  
Block Copolymer ◽  
Film Thickness ◽  
Self Assembly

scholarly journals Influence of block copolymer feature size on reactive ion etching pattern transfer into silicon

2017 ◽  
Vol 28 (40) ◽  
pp. 404001 ◽  
Author(s):  
M Dialameh ◽  
F Ferrarese Lupi ◽  
D Imbraguglio ◽  
F Zanenga ◽  
A Lamperti ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Reactive Ion Etching ◽  
Pattern Transfer ◽  
Feature Size ◽  
Ion Etching ◽  
Etching Pattern

SEE characteristics of small feature size devices by using laser backside testing

2012 ◽  
Vol 33 (1) ◽  
pp. 014008 ◽  
Author(s):  
Guoqiang Feng ◽  
Shipeng Shangguan ◽  
Yingqi Ma ◽  
Jianwei Han
Keyword(s):  
Feature Size ◽  
Small Feature

Film Thickness and Composition Effects in Symmetric Ternary Block Copolymer/Homopolymer Blend Films: Domain Spacing and Orientation

2021 ◽  
Vol 54 (17) ◽  
pp. 7970-7986
Author(s):  
Kristof Toth ◽  
Suwon Bae ◽  
Chinedum O. Osuji ◽  
Kevin G. Yager ◽  
Gregory S. Doerk
Keyword(s):  
Block Copolymer ◽  
Film Thickness ◽  
Blend Films ◽  
Composition Effects

Self-assembled PS-PMMA nanodot array pattern arranged in a parallelogram guide

2005 ◽  
Vol 901 ◽  
Author(s):  
Kaori Kimura ◽  
Masatoshi Sakurai
Keyword(s):  
Phase Separation ◽  
Block Copolymer ◽  
Film Thickness ◽  
Nanoimprint Lithography ◽  
Pmma Film ◽  
Patterned Media ◽  
Nanodot Array ◽  
Self Assembling ◽  
Array Pattern ◽  
Self Assembled

AbstractMask patterns for XY-type magnetic patterned media using phase separation of polystyrene-polymethylmethacrylate (PS-PMMA) block copolymer were fabricated. Parallelogram guides molded by the nanoimprint lithography controlled the PS-PMMA self-assembling pattern that formed in the guide area. 45nm-pitch defect-free PS-PMMA dot patterns were obtained within a 1μm × 1μm area by optimizing the PS-PMMA film thickness.

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