Film Thickness and Composition Effects in Symmetric Ternary Block Copolymer/Homopolymer Blend Films: Domain Spacing and Orientation

2021 ◽  
Vol 54 (17) ◽  
pp. 7970-7986
Author(s):  
Kristof Toth ◽  
Suwon Bae ◽  
Chinedum O. Osuji ◽  
Kevin G. Yager ◽  
Gregory S. Doerk
2019 ◽  
Vol 7 (1) ◽  
pp. 1901605 ◽  
Author(s):  
Katharina Brassat ◽  
Daniel Kool ◽  
Colin G. A. Nallet ◽  
Jörg K. N. Lindner

2005 ◽  
Vol 901 ◽  
Author(s):  
Kaori Kimura ◽  
Masatoshi Sakurai

AbstractMask patterns for XY-type magnetic patterned media using phase separation of polystyrene-polymethylmethacrylate (PS-PMMA) block copolymer were fabricated. Parallelogram guides molded by the nanoimprint lithography controlled the PS-PMMA self-assembling pattern that formed in the guide area. 45nm-pitch defect-free PS-PMMA dot patterns were obtained within a 1μm × 1μm area by optimizing the PS-PMMA film thickness.


Soft Matter ◽  
2007 ◽  
Vol 3 (7) ◽  
pp. 916-921 ◽  
Author(s):  
Thomas G. Fitzgerald ◽  
Francesca Borsetto ◽  
John M. O'Callaghan ◽  
Barbara Kosmala ◽  
Justin D. Holmes ◽  
...  

2000 ◽  
Vol 629 ◽  
Author(s):  
Ratchana Limary ◽  
Peter F. Green

ABSTRACTSymmetric diblock copolymers undergo a disorder to order transition below a microphase separation transition temperature. In this temperature range the structure is characterized by alternating lamellae of thickness L. In thin film geometries, the lamellae are oriented normal to the substrate if there is a preferential interaction between either of the block constituents and the substrate/copolymer or copolymer/vacuum interfaces. Depending on the relation between the film thickness and L, the topography of the film might comprise of holes, islands or spinodal-like structures. We show that in a polystyrene-b-poly(methyl methacrylate) diblock copolymer of molecular weight 20, 000 g/mol, above the microphase separation transition temperature, the topography of the film depends on the thickness. A heirarchy of bicontinuous patterns and holes is observed with increasing film thickness for films thinner than 35 nm.


2011 ◽  
Vol 115 (12) ◽  
pp. 2899-2909 ◽  
Author(s):  
Robert Meier ◽  
Matthias A. Ruderer ◽  
Alexander Diethert ◽  
Gunar Kaune ◽  
Volker Körstgens ◽  
...  

2019 ◽  
Vol 11 (38) ◽  
pp. 35247-35254 ◽  
Author(s):  
Elisheva Michman ◽  
Marcel Langenberg ◽  
Roland Stenger ◽  
Meirav Oded ◽  
Mark Schvartzman ◽  
...  

Langmuir ◽  
2011 ◽  
Vol 27 (21) ◽  
pp. 13072-13081 ◽  
Author(s):  
Meng Ma ◽  
Zhoukun He ◽  
Jinghui Yang ◽  
Feng Chen ◽  
Ke Wang ◽  
...  

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