Thin-film growth of low temperature lead antimony sulfide plagionite phases

2006 ◽  
pp. 3543 ◽  
Author(s):  
Matthieu Y. Versavel ◽  
Joel A. Haber
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Film Growth ◽  
Thin Film Growth ◽  
Antimony Sulfide

scholarly journals Low Temperature Epitaxial Barium Titanate Thin Film Growth in High Vacuum CVD

2017 ◽  
Vol 4 (18) ◽  
pp. 1700116 ◽  
Author(s):  
Michael Reinke ◽  
Yury Kuzminykh ◽  
Felix Eltes ◽  
Stefan Abel ◽  
Thomas LaGrange ◽  
...  
Keyword(s):  
Thin Film ◽  
Barium Titanate ◽  
Low Temperature ◽  
Film Growth ◽  
High Vacuum ◽  
Thin Film Growth ◽  
Barium Titanate Thin Film ◽  
Titanate Thin Film

Low-temperature laser-CVD thin film growth of SiC from Si2H6 and C2H2

2003 ◽  
Vol 258 (3-4) ◽  
pp. 272-276 ◽  
Author(s):  
A Santoni ◽  
J Lancok ◽  
S Loreti ◽  
I Menicucci ◽  
C Minarini ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Film Growth ◽  
Thin Film Growth ◽  
Laser Cvd

Mechanism of rubrene thin film growth using α-quaterthiophene inducing layer at low temperature

2017 ◽  
Vol 621 ◽  
pp. 131-136 ◽  
Author(s):  
Lijuan Wang ◽  
Chuang Yan ◽  
Liang Zhang ◽  
Yang Sun ◽  
Li Yin ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Film Growth ◽  
Thin Film Growth

Ultrathin Silicon Dioxide Films: Photo-Induced Growth

1988 ◽  
Vol 129 ◽  
Author(s):  
Ian W. Boyd
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Silicon Dioxide ◽  
Uv Radiation ◽  
Low Temperatures ◽  
Film Growth ◽  
Thin Film Growth ◽  
Photon Beams ◽  
Visible Radiation ◽  
Oxidation Rates

ABSTRACTThe reaction of oxygen with silicon induced by intense photon beams at different wavelengths is described. We find different enhancement rates applying to UV and visible radiation, which can be as high as 400% for thin film growth at low temperatures. Often, however, they can be so small that they may be completely overshadowed at high temperatures by the rapid oxidation rates arising from thermal contributions. By using UV radiation projected through a mask to induce low temperature photonic oxidation of silicon, we have grown directly patterned oxide structures dispensing with the need for conventional photolithographic etching.

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