scholarly journals Effects of Cross‐Sheet Density and Temperature Inhomogeneities on Magnetotail Reconnection

2019 ◽  
Vol 46 (1) ◽  
pp. 28-36 ◽  
Author(s):  
San Lu ◽  
A. V. Artemyev ◽  
V. Angelopoulos ◽  
P. L. Pritchett ◽  
A. Runov
1989 ◽  
Vol 25 (17) ◽  
pp. 1147
Author(s):  
A.L. Powell ◽  
J.S. Roberts ◽  
P.I. Rockett ◽  
T.J. Foster ◽  
L. Eaves

2008 ◽  
Vol 113 (A12) ◽  
pp. n/a-n/a ◽  
Author(s):  
J. Egedal ◽  
W. Fox ◽  
N. Katz ◽  
M. Porkolab ◽  
M. Øieroset ◽  
...  

Author(s):  
Ian J. Cohen ◽  
Drew L. Turner ◽  
Barry H. Mauk ◽  
Sam T. Bingham ◽  
J. Bern Blake ◽  
...  

Author(s):  
A. Bellakhdar ◽  
A. Telia ◽  
J. L. Coutaz

We present an analytical model for the I-V characteristics of AlGaN/GaN and AlInN/GaN high electron mobility transistors (HEMT). Our study focuses on the influence of a GaN capping layer, and of thermal and self-heating effects. Spontaneous and piezoelectric polarizations at Al (Ga,In)N/GaN and GaN/Al(Ga,In)N interfaces have been incorporated in the analysis. Our model permits to fit several published data. Our results indicate that the GaN cap layer reduces the sheet density of the two-dimensional electron gas (2DEG), leading to a decrease of the drain current, and that n+-doped GaN cap layer provides a higher sheet density than undoped one. In n+GaN/AlInN/GaN HEMTs, the sheet carrier concentration is higher than in n+GaN/AlGaN/GaN HEMTs, due to the higher spontaneous polarization charge and conduction band discontinuity at the substrate/barrier layer interface.


2019 ◽  
Vol 114 (6) ◽  
pp. 063502 ◽  
Author(s):  
Siddhartha Ghosh ◽  
Mark A. Hollis ◽  
Richard J. Molnar
Keyword(s):  

2019 ◽  
Vol 46 (19) ◽  
pp. 10744-10753 ◽  
Author(s):  
Xiancai Yu ◽  
Rongsheng Wang ◽  
Quanming Lu ◽  
Christopher T. Russell ◽  
Shui Wang

Sign in / Sign up

Export Citation Format

Share Document