Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication
2015 ◽
Vol 143
(24)
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pp. 244904
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2002 ◽
Vol 365
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pp. 260-266
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2011 ◽
pp. 193-208
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2006 ◽
Vol 110
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pp. 23123-23129
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2003 ◽
2019 ◽
Vol 475
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pp. 1883-1909
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