Quantum Dot Made in Metal Oxide Silicon-Nanowire Field Effect Transistor Working at Room Temperature.

Nano Letters ◽  
2015 ◽  
Vol 15 (5) ◽  
pp. 2958-2964 ◽  
Author(s):  
Romain Lavieville ◽  
François Triozon ◽  
Sylvain Barraud ◽  
Andrea Corna ◽  
Xavier Jehl ◽  
...  
Keyword(s):  
Quantum Dot ◽  
Metal Oxide ◽  
Field Effect ◽  
Room Temperature ◽  
Field Effect Transistor ◽  
Silicon Nanowire ◽  
Effect Transistor ◽  
Metal Oxide Silicon ◽  
Made In

Effect of Metal - Silicon Nanowire Contacts on the Performance of Accumulation Metal Oxide Semiconductor Field Effect Transistor

2008 ◽  
Vol 1144 ◽  
Author(s):  
Pranav Garg ◽  
Yi Hong ◽  
Md. Mash-Hud Iqbal ◽  
Stephen J. Fonash
Keyword(s):  
Metal Oxide ◽  
Silicon Nanowires ◽  
Field Effect ◽  
Field Effect Transistor ◽  
Silicon Nanowire ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Manufacturing Cost ◽  
Effect Transistor ◽  
The Impact

ABSTRACTRecently, we have experimentally demonstrated a very simply structured unipolar accumulation-type metal oxide semiconductor field effect transistor (AMOSFET) using grow-in-place silicon nanowires. The AMOSFET consists of a single doping type nanowire, metal source and drain contacts which are separated by a partially gated region. Despite its simple configuration, it is capable of high performance thereby offering the potential of a low manufacturing-cost transistor. Since the quality of the metal/semiconductor ohmic source and drain contacts impacts AMOSFET performance, we repot here on initial exploration of contact variations and of the impact of thermal process history. With process optimization, current on/off ratios of 106 and subthreshold swings of 70 mV/dec have been achieved with these simple devices

Ge/Si quantum-dot metal–oxide–semiconductor field-effect transistor

2002 ◽  
Vol 80 (25) ◽  
pp. 4783-4785 ◽  
Author(s):  
A. I. Yakimov ◽  
A. V. Dvurechenskii ◽  
V. V. Kirienko ◽  
A. I. Nikiforov
Keyword(s):  
Quantum Dot ◽  
Metal Oxide ◽  
Field Effect ◽  
Field Effect Transistor ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Si Quantum Dot ◽  
Effect Transistor

Substrate current enhancement in 65 nm metal-oxide-silicon field-effect transistor under external mechanical stress

2009 ◽  
Vol 517 (5) ◽  
pp. 1715-1718 ◽  
Author(s):  
Y.J. Kuo ◽  
T.C. Chang ◽  
P.H. Yeh ◽  
S.C. Chen ◽  
C.H. Dai ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Mechanical Stress ◽  
Field Effect ◽  
Field Effect Transistor ◽  
Substrate Current ◽  
Effect Transistor ◽  
Metal Oxide Silicon
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