Variable Pressure Electron Beam Lithography (VP-eBL):  A New Tool for Direct Patterning of Nanometer-Scale Features on Substrates with Low Electrical Conductivity

Nano Letters ◽  
2006 ◽  
Vol 6 (5) ◽  
pp. 963-968 ◽  
Author(s):  
Benjamin D. Myers ◽  
Vinayak P. Dravid
Keyword(s):  
Electrical Conductivity ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Variable Pressure ◽  
Nanometer Scale ◽  
Direct Patterning

Direct Patterning of Zinc Sulfide on a Sub-10 Nanometer Scale via Electron Beam Lithography

ACS Nano ◽  
2017 ◽  
Vol 11 (10) ◽  
pp. 9920-9929 ◽  
Author(s):  
Mohammad S. M. Saifullah ◽  
Mohamed Asbahi ◽  
Maryam Binti-Kamran Kiyani ◽  
Sudhiranjan Tripathy ◽  
Esther A. H. Ong ◽  
...  
Keyword(s):  
Electron Beam ◽  
Zinc Sulfide ◽  
Electron Beam Lithography ◽  
Nanometer Scale ◽  
Direct Patterning

scholarly journals Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography

Nanoscale ◽  
2020 ◽  
Vol 12 (20) ◽  
pp. 11306-11316
Author(s):  
Christian D. Dieleman ◽  
Weiyi Ding ◽  
Lianjia Wu ◽  
Neha Thakur ◽  
Ivan Bespalov ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Extreme Ultraviolet ◽  
Luminescent Properties ◽  
Colloidal Quantum Dots ◽  
Direct Patterning ◽  
One Step ◽  
Patterning Technique

A general, one-step patterning technique for colloidal quantum dots by direct optical or e-beam lithography. Photons (5.5–91.9 eV) and electrons (3 eV–50 kV) crosslink and immobilize QDs down to tens of nm while preserving the luminescent properties.

Sub-10-nm Overlay Accuracy in Electron Beam Lithography for Nanometer-Scale Device Fabrication

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6788-6791 ◽  
Author(s):  
Kenji Yamazaki ◽  
Akira Fujiwara ◽  
Yasuo Takahashi ◽  
Hideo Namatsu ◽  
Kenji Kurihara
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Device Fabrication ◽  
Nanometer Scale

Direct patterning of highly-conductive graphene@copper composites using copper naphthenate as a resist for graphene device applications

Nanoscale ◽  
2017 ◽  
Vol 9 (43) ◽  
pp. 16755-16763 ◽  
Author(s):  
Kaixi Bi ◽  
Quan Xiang ◽  
Yiqin Chen ◽  
Huimin Shi ◽  
Zhiqin Li ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Metal Deposition ◽  
Lithography Process ◽  
Direct Patterning ◽  
Copper Naphthenate ◽  
Device Applications ◽  
Lift Off ◽  
Copper Composite

We report an electron-beam lithography process to directly fabricate graphene@copper composite patterns without involving metal deposition, lift-off and etching processes.

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