Atomistic Simulation of the Formation of Nanoporous Silica Films via Molecular Chemical Vapor Deposition on Nonporous Substrates

Langmuir ◽  
2011 ◽  
Vol 27 (21) ◽  
pp. 13052-13063 ◽  
Author(s):  
Taslima Akter ◽  
Thomas C. McDermott ◽  
J. M. Don MacElroy ◽  
Damian A. Mooney ◽  
Denis P. Dowling
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atomistic Simulation ◽  
Chemical Vapor ◽  
Nanoporous Silica ◽  
Silica Films

Precursors in Atmospheric-Pressure Chemical Vapor Deposition of Silica Films from Tetraethylorthosilicate/Ozone System

1994 ◽  
Vol 33 (Part 2, No. 3B) ◽  
pp. L447-L450 ◽  
Author(s):  
Motoaki Adachi ◽  
Kikuo Okuyama ◽  
Noboru Tohge ◽  
Manabu Shimada ◽  
Jun-ichi Sato ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Silica Films ◽  
Pressure Chemical

Atomistic simulation of the bombardment process during the BEN phase of chemical vapor deposition (CVD) of diamond

2002 ◽  
Vol 11 (3-6) ◽  
pp. 513-518 ◽  
Author(s):  
K. Kohary ◽  
S. Kugler ◽  
Z. Hajnal ◽  
T. Köhler ◽  
T. Frauenheim ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atomistic Simulation ◽  
Chemical Vapor

Chemical-Vapor Deposition of OH-free and Low-kOrganic-Silica Films

1998 ◽  
Vol 37 (Part 1, No. 12A) ◽  
pp. 6369-6373 ◽  
Author(s):  
Yasutaka Uchida ◽  
Kohshi Taguchi ◽  
Tomonori Nagai ◽  
Satoshi Sugahara ◽  
Masakiyo Matsumura
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Silica Films

scholarly journals Modeling heterogeneity and memory effects on the kinetic roughening of silica films grown by chemical vapor deposition

2003 ◽  
Vol 67 (24) ◽  
Author(s):  
Fernando Ojeda ◽  
Rodolfo Cuerno ◽  
Roberto Salvarezza ◽  
Fernando Agulló-Rueda ◽  
Luis Vázquez
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Memory Effects ◽  
Silica Films ◽  
Kinetic Roughening
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