Oxidation Kinetics of Hydrogenated Amorphous Carbon (a-CHx) Overcoats for Magnetic Data Storage Media

Langmuir ◽  
2007 ◽  
Vol 23 (10) ◽  
pp. 5485-5490 ◽  
Author(s):  
Yang Yun ◽  
Xiaoding Ma ◽  
Jing Gui ◽  
Esteban Broitman ◽  
Andrew J. Gellman
Keyword(s):  
Data Storage ◽  
Amorphous Carbon ◽  
Oxidation Kinetics ◽  
Magnetic Data Storage ◽  
Magnetic Data ◽  
Hydrogenated Amorphous Carbon ◽  
Storage Media ◽  
Hydrogenated Amorphous ◽  
Kinetics Of

Issues in Vapor Phase Lubrication of Magnetic Data Storage Media

2005 ◽  
Author(s):  
Andrew J. Gellman ◽  
Yang Yun
Keyword(s):  
Data Storage ◽  
Vapor Phase ◽  
Ambient Air ◽  
Magnetic Data ◽  
Vapor Phase Lubrication ◽  
Initial Oxidation ◽  
Storage Media ◽  
Airborne Contamination ◽  
Langmuir Hinshelwood Mechanism ◽  
Kinetics Of

Vapor phase lubrication (VPL) integrates media lubrication with the vacuum processing steps used throughout most of the hard disk media fabrication process. This avoids exposure of the unlubricated a-CHx overcoat surface to the ambient air and airborne contamination. In vapor lubrication the a-CHx surface can be oxidized under controlled conditions immediately prior to lubricant adsorption. The kinetics of a-CHx oxidation have been studied using x-ray photoemission spectroscopy in an apparatus that allows oxidation of freshly deposited a-CHx films. The dissociative sticking coefficient of oxygen is ∼10−6 and the initial oxidation kinetics can be described by a Langmuir-Hinshelwood mechanism.

Vapor Phase Lubricant Adsorption on Magnetic Data Storage Media

2005 ◽  
Author(s):  
Yang Yun ◽  
Andrew J. Gellman
Keyword(s):  
Data Storage ◽  
Vapor Phase ◽  
Ambient Air ◽  
Magnetic Data ◽  
Vapor Phase Lubrication ◽  
Storage Media ◽  
Airborne Contamination ◽  
Hydrogenated Amorphous ◽  
Processing Steps ◽  
Vapor Lubrication

Vapor phase lubrication (VPL) integrates media lubrication with the vacuum processing steps used throughout most of the hard disk media fabrication process. This avoids exposure of the unlubricated hydrogenated amorphous carbon (a-CHx) overcoat to the ambient air and airborne contamination. In vapor lubrication the a-CHx surface can be oxidized under controlled conditions immediately prior to lubricant adsorption. The interaction between lubricants and a-CHx films can be tailored by controlled oxidation of the a-CHx in vapor phase lubrication.

NITROGEN INCORPORATED HYDROGENATED AMORPHOUS CARBON THIN FILMS DEPOSITED BY MICROWAVE SURFACE-WAVE PLASMA CHEMICAL VAPOR DEPOSITION

2009 ◽  
Vol 23 (09) ◽  
pp. 2159-2165 ◽  
Author(s):  
SUDIP ADHIKARI ◽  
MASAYOSHI UMENO
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Surface Wave ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Hydrogenated Amorphous Carbon ◽  
Plasma Chemical Vapor Deposition ◽  
Hydrogenated Amorphous

Nitrogen incorporated hydrogenated amorphous carbon (a-C:N:H) thin films have been deposited by microwave surface-wave plasma chemical vapor deposition on silicon and quartz substrates, using helium, methane and nitrogen ( N 2) as plasma source. The deposited a-C:N:H films were characterized by their optical, structural and electrical properties through UV/VIS/NIR spectroscopy, Raman spectroscopy, atomic force microscope and current-voltage characteristics. The optical band gap decreased gently from 3.0 eV to 2.5 eV with increasing N 2 concentration in the films. The a-C:N:H film shows significantly higher electrical conductivity compared to that of N 2-free a-C:H film.

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