Enhanced Stability and Activity for Water Oxidation in Alkaline Media with Bismuth Vanadate Photoelectrodes Modified with a Cobalt Oxide Catalytic Layer Produced by Atomic Layer Deposition

2013 ◽  
Vol 4 (23) ◽  
pp. 4188-4191 ◽  
Author(s):  
Michael F. Lichterman ◽  
Matthew R. Shaner ◽  
Sheila G. Handler ◽  
Bruce S. Brunschwig ◽  
Harry B. Gray ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Cobalt Oxide ◽  
Water Oxidation ◽  
Atomic Layer ◽  
Bismuth Vanadate ◽  
Alkaline Media ◽  
Catalytic Layer ◽  
Layer Deposition ◽  
Enhanced Stability

Stabilization of n-cadmium telluride photoanodes for water oxidation to O2(g) in aqueous alkaline electrolytes using amorphous TiO2 films formed by atomic-layer deposition

2014 ◽  
Vol 7 (10) ◽  
pp. 3334-3337 ◽  
Author(s):  
Michael F. Lichterman ◽  
Azhar I. Carim ◽  
Matthew T. McDowell ◽  
Shu Hu ◽  
Harry B. Gray ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Cadmium Telluride ◽  
Water Oxidation ◽  
Atomic Layer ◽  
Alkaline Media ◽  
Tio2 Films ◽  
Layer Deposition ◽  
Alkaline Electrolytes ◽  
Amorphous Tio2

Protection of n-CdTe by ALD-grown TiO2 film for water oxidation to O2(g) in alkaline media.

scholarly journals Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity

Nanomaterials ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 907
Author(s):  
Yury Koshtyal ◽  
Ilya Mitrofanov ◽  
Denis Nazarov ◽  
Oleg Medvedev ◽  
Artem Kim ◽  
...  
Keyword(s):  
Chemical Composition ◽  
Atomic Layer Deposition ◽  
Nickel Oxide ◽  
Cobalt Oxide ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Metallic Nickel ◽  
Uniform Density ◽  
Oxide Content ◽  
Layer Deposition

Nanostructured metal oxides (MOs) demonstrate good electrochemical properties and are regarded as promising anode materials for high-performance lithium-ion batteries (LIBs). The capacity of nickel-cobalt oxides-based materials is among the highest for binary transition metals oxide (TMOs). In the present paper, we report the investigation of Ni-Co-O (NCO) thin films obtained by atomic layer deposition (ALD) using nickel and cobalt metallocenes in a combination with oxygen plasma. The formation of NCO films with different ratios of Ni and Co was provided by ALD cycles leading to the formation of nickel oxide (a) and cobalt oxide (b) in one supercycle (linear combination of a and b cycles). The film thickness was set by the number of supercycles. The synthesized films had a uniform chemical composition over the depth with an admixture of metallic nickel and carbon up to 4 at.%. All samples were characterized by a single NixCo1-xO phase with a cubic face-centered lattice and a uniform density. The surface of the NCO films was uniform, with rare inclusions of nanoparticles 15–30 nm in diameter. The growth rates of all films on steel were higher than those on silicon substrates, and this difference increased with increasing cobalt concentration in the films. In this paper, we propose a method for processing cyclic voltammetry curves for revealing the influence of individual components (nickel oxide, cobalt oxide and solid electrolyte interface—SEI) on the electrochemical capacity. The initial capacity of NCO films was augmented with an increase of nickel oxide content.

scholarly journals Correction: Enhanced photoelectrochemical water oxidation via atomic layer deposition of TiO2on fluorine-doped tin oxide nanoparticle films

Nanoscale ◽  
2015 ◽  
Vol 7 (28) ◽  
pp. 12226-12226 ◽  
Author(s):  
Isvar A. Cordova ◽  
Qing Peng ◽  
Isa L. Ferrall ◽  
Adam J. Rieth ◽  
Paul G. Hoertz ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Tin Oxide ◽  
Water Oxidation ◽  
Atomic Layer ◽  
Nanoparticle Films ◽  
Layer Deposition ◽  
Oxide Nanoparticle ◽  
Photoelectrochemical Water Oxidation

Enhanced stability of Pt/C by the atomic layer deposition of porous MOx for the decarboxylation of oleic acid

2019 ◽  
Vol 123 ◽  
pp. 59-63 ◽  
Author(s):  
Wenwen Lin ◽  
Hao Chen ◽  
Jing Li ◽  
Kequan Chen ◽  
Xiuyang Lu ◽  
...  
Keyword(s):  
Oleic Acid ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Enhanced Stability

Conformal SnOx heterojunction coatings for stabilized photoelectrochemical water oxidation using arrays of silicon microcones

2020 ◽  
Vol 8 (18) ◽  
pp. 9292-9301
Author(s):  
Ivan A. Moreno-Hernandez ◽  
Sisir Yalamanchili ◽  
Harold J. Fu ◽  
Harry A. Atwater ◽  
Bruce S. Brunschwig ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Oxide Layer ◽  
Tin Oxide ◽  
Water Oxidation ◽  
Surface Recombination ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Photoelectrochemical Water Oxidation

A protective tin oxide layer formed by atomic-layer deposition limits surface recombination at n-Si surfaces and produces ∼620 mV of photovoltage on planar n-Si photoanodes. The layer conformally coats structures such as Si microcone arrays.

Passivation of surface states by ALD-grown TiO2 overlayers on Ta3N5 anodes for photoelectrochemical water oxidation

2016 ◽  
Vol 52 (57) ◽  
pp. 8806-8809 ◽  
Author(s):  
Peng Zhang ◽  
Tuo Wang ◽  
Jinlong Gong
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Water Oxidation ◽  
Surface States ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Photoelectrochemical Water Oxidation

This paper describes the fabrication of TiO2 overlayers by atomic layer deposition to passivate the surface states on Ta3N5 thin film anodes for photoelectrochemical water oxidation.

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