Oxidation Kinetics of Mg-, Si-, and Fe-Implanted Aluminum by Using X-ray Photoelectron Spectroscopy

1999 ◽  
Vol 103 (13) ◽  
pp. 2402-2407 ◽  
Author(s):  
T. Do ◽  
N. S. McIntyre ◽  
P. A. W. van der Heide ◽  
U. G. Akano
Keyword(s):  
Photoelectron Spectroscopy ◽  
Oxidation Kinetics ◽  
X Ray ◽  
Kinetics Of

N2O Oxidation Kinetics of Ultra Thin Thermally Grown Silicon Nitride: An Angle Resolved X-Ray Photoelectron Spectroscopy Study

1999 ◽  
Vol 567 ◽  
Author(s):  
A. Y. Mao ◽  
J. Lozano ◽  
J. M. White ◽  
D. L. Kwong
Keyword(s):  
Silicon Nitride ◽  
Film Thickness ◽  
Photoelectron Spectroscopy ◽  
Oxidation Kinetics ◽  
Silicon Oxide ◽  
Spectroscopy Study ◽  
Si Substrate ◽  
X Ray ◽  
Si3n4 Layer ◽  
Kinetics Of

ABSTRACTThe oxidation kinetics of ultra thin thermally NH3-nitrided Si3N4 films in N2O ambient has been extensively studied using angle resolved x-ray photoelectron spectroscopy (ARXPS). Ultra thin (7Å) Si3N4 films formed by RTP nitridation of Si in NH3 were annealed in N2O at various temperatures (700 °C - 1000 °C) for 30 sec. ARXPS showed that Si substrate at the Si-Si3N4 interface was oxidized when annealed at 1000 °C for 30 sec, and was accompanied by the oxidation of the top Si3N4 surface. The total film thickness increases 4–5 times of that of the original Si3N4 layer. However, the oxide formed on the top Si3N4 surface is twice as thick as that formed at the Si3N4/Si interface. No interfacial oxide was found when annealing below 900°C, although the formation of the silicon oxide and oxynitride above the Si3N4 layer was still observed.

GROWTH OF OXIDE LAYER ON GERMANIUM (011) SUBSTRATE UNDER DRY AND WET ATMOSPHERES

1999 ◽  
Vol 06 (06) ◽  
pp. 1053-1060 ◽  
Author(s):  
N. TABET ◽  
J. AL-SADAH ◽  
M. SALIM
Keyword(s):  
Simple Model ◽  
Oxide Film ◽  
Growth Kinetics ◽  
Photoelectron Spectroscopy ◽  
Early Stage ◽  
X Ray ◽  
Apparent Thickness ◽  
Different Temperatures ◽  
Kinetics Of

X-ray Photoelectron Spectroscopy (XPS) has been used to investigate the oxidation of (011) Ge substrates. The sample surfaces were CP4-etched, then annealed in situ, at different temperatures, for various durations. Dry and wet atmospheres were used. The oxidation rate during the early stage was increased by the presence of moisture in the atmosphere. A simple model was used to define and determine an apparent thickness of the oxide film from XPS measurements. The time dependence of the apparent thickness is consistent with a partial coverage of the surface by oxide islands. The growth kinetics of the oxide islands obeys a nearly cubic law.

Oxidation Behavior of Cu60Zr30Ti10 Bulk Metallic Glass

2005 ◽  
Vol 20 (6) ◽  
pp. 1396-1403 ◽  
Author(s):  
C.Y. Tam ◽  
C.H. Shek
Keyword(s):  
Metallic Glass ◽  
Oxide Layer ◽  
Bulk Metallic Glass ◽  
Photoelectron Spectroscopy ◽  
Oxidation Kinetics ◽  
Oxide Surface ◽  
X Ray ◽  
Rate Law ◽  
Cu Content ◽  
Surface Morphologies

The oxidation kinetics of Cu60Zr30Ti10 bulk metallic glass and its crystalline counterpart were studied in oxygen environment over the temperature range of 573–773 K. The oxidation kinetics, measured with thermogravimetric analysis, of the metallic glass follows a linear rate law between 573 and 653 K and a parabolic rate law between 673 and 733 K. It was also found that the oxidation activation energy of metallic glass is lower than that of its crystalline counterpart. The x-ray diffraction pattern showed that the oxide layer is composed of Cu2O, CuO, ZrO2, and metallic Cu. Cu enrichment on the topmost oxide layer of the metallic glass oxidized at 573 K was revealed by x-ray photoelectron spectroscopy while there was a decrease in Cu content in the innermost oxide layer. The oxide surface morphologies observed from scanning electron microscopy showed that ZrO2 granules formed at low temperatures while whiskerlike copper oxides formed at higher temperatures.

scholarly journals Enhanced removal of hexavalent chromium by different acid-modified biochar derived from corn straw: behavior and mechanism

2020 ◽  
Vol 81 (10) ◽  
pp. 2270-2280
Author(s):  
Yonggang Xu ◽  
Tianxia Bai ◽  
Yubo Yan ◽  
Yunfeng Zhao ◽  
Ling Yuan ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Hydrogen Ion ◽  
Corn Straw ◽  
Order Model ◽  
Freundlich Model ◽  
X Ray ◽  
Modified Biochar ◽  
Before And After ◽  
Pseudo Second Order ◽  
Kinetics Of

Abstract It is of great significance to remove Cr(VI) from water as a result of its high toxicity. Biochar from corn straw was modified by different acids (HNO3, H2SO4 and H3PO4) to remove Cr(VI) from aqueous solution. To estimate the removal mechanisms of Cr(VI) by the acid-modified biochars, batch experiments were performed in the light of contact time, Cr(VI) concentration, and pH, and the characteristics of acid-modified biochars before and after Cr(VI) adsorption were investigated by Fourier transform infrared spectra (FTIR) and X-ray photoelectron spectroscopy (XPS). The adsorption kinetics of Cr(VI) by acid-modified biochars were consistent with the pseudo-second-order model, and the adsorption isotherm obeyed the Freundlich model. Furthermore, the acid- modified biochars could supply more oxygen-containing functional groups (-COOH and -OH) as electron donor (e−) and hydrogen ion (H+) to enhance the reduction of Cr(VI) to Cr(III), resulting in enhanced removal of Cr(VI). HNO3-modified biochar exhibited the highest removal efficiency of Cr(VI). In general, the acid modifition of biochar was an effective method to increase the removal of Cr(VI).

X-ray photoelectron spectroscopy study of the growth kinetics of biomimetically grown hydroxyapatite thin-film coatings

2010 ◽  
Vol 256 (23) ◽  
pp. 7178-7185 ◽  
Author(s):  
K. McLeod ◽  
S. Kumar ◽  
N.K. Dutta ◽  
R.St.C. Smart ◽  
N.H. Voelcker ◽  
...  
Keyword(s):  
Thin Film ◽  
Growth Kinetics ◽  
Photoelectron Spectroscopy ◽  
Spectroscopy Study ◽  
X Ray ◽  
Film Coatings ◽  
Thin Film Coatings ◽  
Kinetics Of
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