Etching, Insertion, and Abstraction Reactions of Atomic Deuterium with Amorphous Silicon Hydride Films

1997 ◽  
Vol 101 (46) ◽  
pp. 9537-9547 ◽  
Author(s):  
C.-M. Chiang ◽  
S. M. Gates ◽  
Szetsen S. Lee ◽  
M. Kong ◽  
Stacey F. Bent
2003 ◽  
Vol 547 (3) ◽  
pp. L865-L870 ◽  
Author(s):  
W.M.M. Kessels ◽  
J.P.M. Hoefnagels ◽  
P.J. van den Oever ◽  
Y. Barrell ◽  
M.C.M. van de Sanden

1991 ◽  
Vol 219 ◽  
Author(s):  
Finley R. Shapiro

ABSTRACTThe simulation of a-Si:H solar cells has the potential to make a major contribution to the development of improved devices. However, to achieve this potential, simulations must run quickly on personal computers. This will require simplified approaches which are justified by the correspondence of their results to more elaborate but slower running simulations.


1990 ◽  
Vol 192 ◽  
Author(s):  
George D. Cody

ABSTRACTOptical phenomena associated with the absorption edge of crystalline silicon (c-Si) and amorphous silicon hydride (a-Si:H) are presented and compared. The optical properties discussed include the energy dependence, dipole matrix element and density of states associated with the absorption edge; the temperature dependence of the relevant optical energy gaps, and finally the magnitude and temperature dependence of the slope of the Urbach edge for each material. The comparison suggests that the optical properties of the two materials are closely related and that the absorption edge of a-Si:H may be derived from the effect of site disorder on the zone center direct gap of c-Si.


2003 ◽  
Vol 80 (1) ◽  
pp. 1-20 ◽  
Author(s):  
Randell L Mills ◽  
Bala Dhandapani ◽  
Jiliang He

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