Thermal stability of RuO2 thin films prepared by modified atomic layer deposition

2012 ◽  
Vol 12 ◽  
pp. S160-S163 ◽  
Author(s):  
Jin-Hyock Kim ◽  
Ji-Hoon Ahn ◽  
Sang-Won Kang ◽  
Jae-Sung Roh ◽  
Se-Hun Kwon ◽  
...  
Author(s):  
Changyu Park ◽  
Changmin Lee ◽  
Woohui Lee ◽  
Jehoon Lee ◽  
Jinyong Kim ◽  
...  

Nanoscale ◽  
2020 ◽  
Vol 12 (21) ◽  
pp. 11684-11693
Author(s):  
Eduardo Solano ◽  
Jolien Dendooven ◽  
Ji-Yu Feng ◽  
Philipp Brüner ◽  
Matthias M. Minjauw ◽  
...  

Supported Pt nanoparticle stabilization via Atomic Layer Deposition overcoating with Al2O3 has been proved to prevent particle coarsening during thermal annealing for widely spaced nanoparticles while ensuring surface accessibility for applications.


2020 ◽  
Vol 8 (31) ◽  
pp. 15927-15935
Author(s):  
Haoyu Li ◽  
Hung-Sen Kang ◽  
Simranjit Grewal ◽  
Art J. Nelson ◽  
Shin Ae Song ◽  
...  

In this report, we demonstrate how a uniform angstrom-level oxide overcoat (0.7–1.5 Å) by atomic layer deposition is highly effective not only in enhancing the thermal stability of underlying infiltrated ceria nanoparticles but also in facilitating electrode kinetics.


2015 ◽  
Author(s):  
P. Zhang ◽  
Changhong Sun ◽  
Y. Zhang ◽  
X. Chen ◽  
Y. Y. Chen ◽  
...  

2020 ◽  
Vol 40 (10) ◽  
pp. 3592-3599 ◽  
Author(s):  
Sang-Soon Lim ◽  
Kwang-Chon Kim ◽  
Hansol Jeon ◽  
Ju-Young Kim ◽  
Jun-Yun Kang ◽  
...  

2015 ◽  
Author(s):  
P. Zhang ◽  
C. H. Sun ◽  
Y. Zhang ◽  
X. Chen ◽  
K. He ◽  
...  

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