Surface Chemistry and Thermal Stability of Fe Nanoparticles Annealed under Ultrahigh-Vacuum Conditions

2011 ◽  
Vol 115 (26) ◽  
pp. 12972-12980 ◽  
Author(s):  
Long Chen ◽  
Arthur Yelon ◽  
Edward Sacher
Keyword(s):  
Thermal Stability ◽  
Surface Chemistry ◽  
Ultrahigh Vacuum ◽  
Fe Nanoparticles ◽  
Thermal Stability Of

The thermal stability of SiGe films deposited by ultrahigh‐vacuum chemical vapor deposition

1991 ◽  
Vol 70 (3) ◽  
pp. 1416-1420 ◽  
Author(s):  
S. R. Stiffler ◽  
J. H. Comfort ◽  
C. L. Stanis ◽  
D. L. Harame ◽  
E. de Frésart ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Ultrahigh Vacuum ◽  
Chemical Vapor ◽  
Thermal Stability Of

Thermal stability of composites containing HCl-doped polyaniline and Fe nanoparticles

2010 ◽  
Vol 120 (1) ◽  
pp. 127-133 ◽  
Author(s):  
Gaorui Ren ◽  
Hong Qiu ◽  
Qing Wu ◽  
Hui Li ◽  
Huili Fan ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Fe Nanoparticles ◽  
Doped Polyaniline ◽  
Thermal Stability Of

Optimizing Growth Rates and Thermal Stability of Silver Nanowires

2007 ◽  
Vol 1017 ◽  
Author(s):  
Byron D. Gates ◽  
Byron D. Gates
Keyword(s):  
Thermal Stability ◽  
Surface Chemistry ◽  
Growth Rates ◽  
Silver Nanowires ◽  
Multiple Solution ◽  
Solution Phase ◽  
Mechanism Of Growth ◽  
Thermal Stability Of ◽  
Insight Into

AbstractThere are multiple solution-phase approaches to synthesizing nanowires, yet some aspects of these syntheses are not well understood. Solution-phase methods are attractive for the ease of scaling to large quantities, which is a necessary step for applications utilizing nanowires. However, insight into the surface chemistry and mechanism of growth of the nanowires is essential for increasing the yield of nanowires. An improved synthesis of silver nanowires is presented along with insight into the mechanism of growth and stabilization of the nanowires. The techniques from this modified synthesis could be extended to a number of other solution-phase procedures to increase the yield of nanostructures.

Thermal stability of bimetallic Au/Fe nanoparticles in silica matrix

2014 ◽  
Author(s):  
Compesh Pannu ◽  
Udai B. Singh ◽  
Sonu Hooda ◽  
D. Kabiraj ◽  
D. K. Avasthi
Keyword(s):  
Thermal Stability ◽  
Silica Matrix ◽  
Fe Nanoparticles ◽  
Thermal Stability Of

Interfacial Reactions and Thermal Stability of Ultrahigh Vacuum Deposited Multilayered Mo/Si Structures

1995 ◽  
Vol 382 ◽  
Author(s):  
J.M. Liang ◽  
L.J. Chen
Keyword(s):  
Thermal Stability ◽  
Function Analysis ◽  
Ultrahigh Vacuum ◽  
Interfacial Reactions ◽  
Silicide Phase ◽  
Transmission Electron ◽  
Bilayer Period ◽  
Auto Correlation Function ◽  
The Stability ◽  
Thermal Stability Of

ABSTRACTInterfacial reactions and thermal stability of ultrahigh vacuum deposited multilayered Mo/Si structures have been investigated by high resolution transmission electron microscopy in conjunction with fast Fourier transform and auto–correlation function analysis. For samples with nominal atomic ratios Mo:Si = 1:2 and 3:1, well defined multilayered Mo/Si structures were obtained after annealing at 250 °C for 30 min. On the other hand, distinct multilayered MoSi2/Si structure was formed only for Mo:Si = 1:2 samples after annealing at 650 °C for 1 h.Multiphases were observed to form simultaneously in samples annealed at 400–500 °C. After 650 °C annealing for 1 h, tetragonal MoSi2 was the only silicide phase observed for the Mo:Si = 1:2 samples, whereas both tetragonal and hexagonal MoSi2 were present in Mo:Si = 3:1 samples. The stability of the multilayered Mo/Si structures was found to depend critically on the atomic ratios of constituent elements, bilayer period and annealing conditions. The results are interpreted in terms of the delicate balance between intermixing of constituent atoms and silicide formation.

Thermal stability of the methyl group adsorbed on Si( 100): CH3I surface chemistry

1991 ◽  
Vol 257 (1-3) ◽  
pp. 146-156 ◽  
Author(s):  
H. Gutleben ◽  
S.R. Lucas ◽  
C.C. Cheng ◽  
W.J. Choyke ◽  
J.T. Yates
Keyword(s):  
Thermal Stability ◽  
Surface Chemistry ◽  
Methyl Group ◽  
Thermal Stability Of

Erratum: The thermal stability of SiGe films deposited by ultrahigh vacuum chemical vapor deposition [J. Appl. Phys. 70, 1416 (1991)]

1991 ◽  
Vol 70 (11) ◽  
pp. 7194-7194 ◽  
Author(s):  
S. R. Stiffler ◽  
J. H. Comfort ◽  
C. L. Stanis ◽  
D. L. Harame ◽  
E. de Fresart ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Ultrahigh Vacuum ◽  
Chemical Vapor ◽  
Thermal Stability Of
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