Protein Nanostructures Formed via Direct-Write Dip-Pen Nanolithography

2003 ◽  
Vol 125 (19) ◽  
pp. 5588-5589 ◽  
Author(s):  
Ki-Bum Lee ◽  
Jung-Hyurk Lim ◽  
Chad A. Mirkin
Keyword(s):  
Direct Write ◽  
Dip Pen Nanolithography

Patterned Deposition of Nanoparticles Using Dip Pen Nanolithography For Synthesis of Carbon Nanotubes

2015 ◽  
Vol 1752 ◽  
pp. 65-70
Author(s):  
Kevin F. Dahlberg ◽  
Kelly Woods ◽  
Carol Jenkins ◽  
Christine C. Broadbridge ◽  
Todd C. Schwendemann
Keyword(s):  
Chemical Vapor ◽  
Growth Conditions ◽  
Direct Write ◽  
Patterned Substrate ◽  
Nanoparticle Catalysts ◽  
Analysis Process ◽  
Nucleation Sites ◽  
Wide Range ◽  
Synthesis Of Carbon Nanotubes ◽  
Dip Pen Nanolithography

AbstractOrdered carbon nanotube (CNT) growth by deposition of nanoparticle catalysts using dip pen nanolithography (DPN) is presented. DPN is a direct write, tip based lithography technique capable of multi-component deposition of a wide range of materials with nanometer precision. A NanoInk NLP 2000 is used to pattern different catalytic nanoparticle solutions on various substrates. To generate a uniform pattern of nanoparticle clusters, various conditions need to be considered. These parameters include: the humidity in the vessel, temperature, and tip-surface dwell time. By patterning different nanoparticle solutions next to each other, identical growth conditions can be compared for different catalysts in a streamlined analysis process. Fe, Ni, and Co nanoparticle solutions patterned on silicon, mica, and graphite substrates serve as nucleation sites for CNT growth. The CNTs were synthesized by a chemical vapor deposition (CVD) reaction. Each nanoparticle patterned substrate is placed in a tube furnace held at 725°C during CNT growth. The carbon source used in the growth chamber is toluene. The toluene is injected at a rate of 5 mL/hr. Growth is observed for Fe and Ni nanoparticle patterns, but is lacking for the Co patterns. The results of these reactions provide important information regarding efficient and highly reproducible mechanisms for CNT growth.

A Direct-Write Single-Step Positive Etch Resist for Dip-Pen Nanolithography

Small ◽  
2007 ◽  
Vol 3 (12) ◽  
pp. 2034-2037 ◽  
Author(s):  
Joseph H. Wei ◽  
David S. Ginger
Keyword(s):  
Single Step ◽  
Direct Write ◽  
Dip Pen Nanolithography

pH-Responsive Fluorescent Nanoarrays Fabricated by Direct-Write Parallel Dip-Pen Nanolithography

Small ◽  
2008 ◽  
Vol 4 (12) ◽  
pp. 2131-2135 ◽  
Author(s):  
Alberto Martínez-Otero ◽  
Jordi Hernando ◽  
Daniel Ruiz-Molina ◽  
Daniel Maspoch
Keyword(s):  
Direct Write ◽  
Ph Responsive ◽  
Dip Pen Nanolithography

scholarly journals Direct-Write Dip-Pen Nanolithography of Proteins on Modified Silicon Oxide Surfaces

2003 ◽  
Vol 42 (20) ◽  
pp. 2309-2312 ◽  
Author(s):  
Jung-Hyurk Lim ◽  
David S. Ginger ◽  
Ki-Bum Lee ◽  
Jungseok Heo ◽  
Jwa-Min Nam ◽  
...  
Keyword(s):  
Silicon Oxide ◽  
Oxide Surfaces ◽  
Direct Write ◽  
Dip Pen Nanolithography

Direct-Write Patterning of Bacterial Cells by Dip-Pen Nanolithography

2012 ◽  
Vol 134 (40) ◽  
pp. 16500-16503 ◽  
Author(s):  
Jieun Kim ◽  
Young-Hun Shin ◽  
Seong-Hun Yun ◽  
Dong-Sik Choi ◽  
Ji-Hye Nam ◽  
...  
Keyword(s):  
Direct Write ◽  
Bacterial Cells ◽  
Dip Pen Nanolithography

ELECTRON BEAM DIRECT WRITE EFFECTS ON CMOS DEVICES

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-291-C4-294
Author(s):  
K. BARLOW
Keyword(s):  
Electron Beam ◽  
Direct Write
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