Deliberate modification of the behavior of n-type cadmium telluride/electrolyte interfaces by surface etching. Removal of Fermi level pinning

1981 ◽  
Vol 85 (25) ◽  
pp. 3778-3787 ◽  
Author(s):  
Shinichi Tanaka ◽  
James A. Bruce ◽  
Mark S. Wrighton
1996 ◽  
Vol 451 ◽  
Author(s):  
O. Henrion ◽  
A. Klein ◽  
C. Ettenkofer ◽  
W. Jaegermann

ABSTRACTTo investigate the initial steps of GaAs etching Br2 and H2O were (co)adsorbed onto the (110) cleavage plane at 100 K and the interaction investigated by SXPS and LEED. H2O is dissociatively adsorbed at low temperatures and leads to Fermi level pinning close to midgap. Br2 leads, depending on coverage, to the formation of bromides of different stoichiometries. During annealing to 290 K the bromides mostly evaporate from the surface (etching). Br2 and H2O coadsorption leads to Ga-oxide remaining on the surface. For the reactive interfaces band bending is not observed. The results of the adsorption experiments are compared to electrochemically prepared surfaces.


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Author(s):  
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1992 ◽  
Vol 61 (13) ◽  
pp. 1585-1587 ◽  
Author(s):  
H. Shen ◽  
F. C. Rong ◽  
R. Lux ◽  
J. Pamulapati ◽  
M. Taysing‐Lara ◽  
...  

1994 ◽  
Vol 50 (7) ◽  
pp. 4893-4896 ◽  
Author(s):  
Y. Miura ◽  
S. Fujieda ◽  
K. Hirose

Author(s):  
Henry Yu ◽  
Sunny Gupta ◽  
Alex Kutana ◽  
Boris I. Yakobson

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