THE MECHANISM OF OXIDATION BY HYDROGEN ATOMS IN AQUEOUS SOLUTION. PART II. REACTION MECHANISMS WITH DIFFERENT SCAVENGERS

1961 ◽  
Vol 65 (6) ◽  
pp. 960-964 ◽  
Author(s):  
Gideon Czapski ◽  
Joshua Jortner ◽  
Gabriel Stein
2009 ◽  
Vol 87 (1) ◽  
pp. 110-120 ◽  
Author(s):  
Julia R Khusnutdinova ◽  
Peter Y Zavalij ◽  
Andrei N Vedernikov

Oxidation of phenyl PtII complexes K[(dpms)PtIIPh2], 1, (dpms)PtIIPh(MeOH), 2, (dpms)PtIIPh(OH2), 3, and methyl PtII complex (dpms)PtIIMe(NH2Ph), 6, with O2 in aqueous or methanol solutions under ambient conditions leads to corresponding (dpms)PtIVR(X)OH complexes (R = X = Ph, 7; R = Ph, X = OH, 8; R = Ph, X = OMe, 9; R = Me, X = NHPh; 11; dpms = di(2-pyridyl)methanesulfonate). Complexes 7–9 could be isolated in high yield. Complex 11 as well as its phenyl analogue (dpms)PtIVPh(NHPh)OH, 10 can be prepared in high yield by oxidation of corresponding (dpms)PtIIR(NH2Ph) with H2O2 in methanol. Phenyl PtII complexes (dpms)PtIIPh(HX) derived from HX = aniline and DMSO, 4 and 5, respectively, are inert toward O2. The rate of oxidation of 1–5 with O2 decreases in the order 1 > 3 ~ 2 » 4, and 5 is unreactive. Methyl analogues are significantly more reactive compared with their phenyl counterparts. Proposed mechanism of oxidation with O2 includes formation of anionic species (dpms)PtIIR(X)– responsible for reaction with dioxygen. Attempts at C–O and C–N reductive elimination from phenyl PtIV complexes 7–10 do not lead to phenyl derivatives PhX at 80–100 °C, consistent with the results of the DFT estimates of corresponding activation barriers, ΔG0 exceeding 28 kcal/mol.Key words: platinum phenyl complexes, oxidation, dioxygen, aqueous solution, mechanism.


1996 ◽  
Vol 92 (14) ◽  
pp. 2541 ◽  
Author(s):  
Stephen P. Mezyk ◽  
Miyoko Tateishi ◽  
Roy MacFarlane ◽  
David M. Bartels

2019 ◽  
Vol 4 (17) ◽  
pp. 4944-4951
Author(s):  
Daisuke Kusuyama ◽  
Yuta Samukawa ◽  
Tomoaki Sugaya ◽  
Satoshi Iwatsuki ◽  
Masahiko Inamo ◽  
...  

1998 ◽  
Vol 546 ◽  
Author(s):  
M. Tomita ◽  
M. Murahara

AbstractCircuit patterned nucleation of copper atoms onto polyimide surface was demonstrated by using ArF excimer laser (λ =193nm) and copper sulfate aqueous solution at an atmospheric pressure. Photo-excited C-H bonds of the polyimide surface were effectively dehydrated with hydrogen atoms which were photodissociated from the water. The dangling bonds of the dehydrated hydrogen atoms were combined with the oxygen and the copper atoms which were photodissociated by copper-sulfate aqueous solution. Thus, C-O-Cu bonds were formed on the surface. After this copper substitution, it was carried out onto the nucleated parts by usual electroless plating at 70°C. In this process, the conductive circuit pattern Cu thin film was deposited on polyimide surface.


1983 ◽  
Vol 48 (7) ◽  
pp. 992-995 ◽  
Author(s):  
Elizabeth P. Burrows ◽  
David H. Rosenblatt

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