X-ray absorption spectroscopy, x-ray photoelectron spectroscopy, and analytical electron microscopy studies of cobalt catalysts. 1. Characterization of calcined catalysts

1989 ◽  
Vol 93 (8) ◽  
pp. 3188-3194 ◽  
Author(s):  
David G. Castner ◽  
Philip R. Watson ◽  
Ignatius Y. Chan
Keyword(s):  
Electron Microscopy ◽  
Absorption Spectroscopy ◽  
Photoelectron Spectroscopy ◽  
Analytical Electron Microscopy ◽  
Cobalt Catalysts ◽  
X Ray ◽  
Analytical Electron ◽  
X Ray Absorption

Characterization of Nanocomposite Coatings in the System Ti-B-N by Analytical Electron Microscopy and X-Ray Photoelectron Spectroscopy

2002 ◽  
pp. 101-112 ◽  
Author(s):  
Andreas Gupper ◽  
Asunción Fernández ◽  
Christina Fernández-Ramos ◽  
Ferdinand Hofer ◽  
Christian Mitterer ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Photoelectron Spectroscopy ◽  
Analytical Electron Microscopy ◽  
Nanocomposite Coatings ◽  
X Ray ◽  
Analytical Electron

Characterization of Nanocomposite Coatings in the System Ti-B-N by Analytical Electron Microscopy and X-Ray Photoelectron Spectroscopy

2002 ◽  
Vol 133 (6) ◽  
pp. 837-848 ◽  
Author(s):  
Andreas Gupper ◽  
Asunción Fernández ◽  
Christina Fernández-Ramos ◽  
Ferdinand Hofer ◽  
Christian Mitterer ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Photoelectron Spectroscopy ◽  
Analytical Electron Microscopy ◽  
Nanocomposite Coatings ◽  
X Ray ◽  
Analytical Electron

Characterization of Si(Li) x-ray detector efficiencies in the low energy range

1986 ◽  
Vol 44 ◽  
pp. 710-711
Author(s):  
G. Wirmark ◽  
G. Wahlberg ◽  
H. Nordén
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Energy Range ◽  
Analytical Electron Microscopy ◽  
Low Energy ◽  
Ratio Method ◽  
X Ray ◽  
Standard Specimens ◽  
Analytical Electron

X-ray microanalysis with windowless or ultra-thin window Si(Li)-detectors is becoming increasingly important in analytical electron microscopy. The most common approach in the quantification of this method is the thin film ratio method.where CA and CB denote the concentrations of elements A and B respectively and IA and IB are the corresponding x-ray intensities. The KAB-factor should ideally be determined from analyses of standard specimens of known compositions.

scholarly journals Correlative 3D-Characterization of Liquid Metal Catalysts (LMC) utilizing X-ray and Analytical Electron Microscopy

2018 ◽  
Vol 24 (S2) ◽  
pp. 556-557 ◽  
Author(s):  
Janis Wirth ◽  
Silvan Englisch ◽  
Christian Wiktor ◽  
Nicola Taccardi ◽  
Peter Wasserscheid ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Liquid Metal ◽  
Analytical Electron Microscopy ◽  
Metal Catalysts ◽  
X Ray ◽  
Analytical Electron

scholarly journals Investigation of nanoparticulate silicon as printed layers using scanning electron microscopy, transmission electron microscopy, X-ray absorption spectroscopy and X-ray photoelectron spectroscopy

2017 ◽  
Vol 24 (5) ◽  
pp. 1017-1023
Author(s):  
David M. Unuigbe ◽  
Margit Harting ◽  
Emmanuel O. Jonah ◽  
David T. Britton ◽  
Dennis Nordlund
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Absorption Spectroscopy ◽  
Photoelectron Spectroscopy ◽  
Silicon Nanoparticles ◽  
X Ray ◽  
Transmission Electron ◽  
X Ray Absorption ◽  
Scanning Electron

The presence of native oxide on the surface of silicon nanoparticles is known to inhibit charge transport on the surfaces. Scanning electron microscopy (SEM) studies reveal that the particles in the printed silicon network have a wide range of sizes and shapes. High-resolution transmission electron microscopy reveals that the particle surfaces have mainly the (111)- and (100)-oriented planes which stabilizes against further oxidation of the particles. X-ray absorption spectroscopy (XANES) and X-ray photoelectron spectroscopy (XPS) measurements at the O 1s-edge have been utilized to study the oxidation and local atomic structure of printed layers of silicon nanoparticles which were milled for different times. XANES results reveal the presence of the +4 (SiO2) oxidation state which tends towards the +2 (SiO) state for higher milling times. Si 2pXPS results indicate that the surfaces of the silicon nanoparticles in the printed layers are only partially oxidized and that all three sub-oxide, +1 (Si2O), +2 (SiO) and +3 (Si2O3), states are present. The analysis of the change in the sub-oxide peaks of the silicon nanoparticles shows the dominance of the +4 state only for lower milling times.

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