Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
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2016 ◽
Vol 34
(3)
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pp. 892-897
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2000 ◽
Vol 18
(4)
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pp. 1595-1598
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Applications of atomic layer chemical vapor deposition for the processing of nanolaminate structures
2002 ◽
Vol 19
(3)
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pp. 451-462
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2020 ◽
Vol 13
(7)
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pp. 1997-2023
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2019 ◽
Vol 37
(6)
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pp. 060903
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