Telluroether and Selenoether Complexes as Single Source Reagents for Low Pressure Chemical Vapor Deposition of Crystalline Ga2Te3 and Ga2Se3 Thin Films

2013 ◽  
Vol 25 (9) ◽  
pp. 1829-1836 ◽  
Author(s):  
Kathryn George ◽  
C. H. (Kees) de Groot ◽  
Chitra Gurnani ◽  
Andrew L. Hector ◽  
Ruomeng Huang ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Single Source ◽  
Pressure Chemical

A Novel Direct Liquid Injection Low Pressure Chemical Vapor Deposition System (DLI-LPCVD) for the Deposition of Thin Films

2017 ◽  
Vol 19 (8) ◽  
pp. 1700193 ◽  
Author(s):  
Mattias Vervaele ◽  
Bert De Roo ◽  
Jolien Debehets ◽  
Marilyne Sousa ◽  
Luman Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Liquid Injection ◽  
Pressure Chemical ◽  
Direct Liquid Injection

Homoepitaxial growth of β-Ga2O3 thin films by low pressure chemical vapor deposition

2016 ◽  
Vol 108 (18) ◽  
pp. 182105 ◽  
Author(s):  
Subrina Rafique ◽  
Lu Han ◽  
Marko J. Tadjer ◽  
Jaime A. Freitas ◽  
Nadeemullah A. Mahadik ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Homoepitaxial Growth ◽  
Pressure Chemical

Direct Liquid Injection − Low Pressure Chemical Vapor Deposition of Silica Thin Films from Di-t-butoxydiacetoxysilane

2017 ◽  
Vol 19 (12) ◽  
pp. 1700425 ◽  
Author(s):  
Mattias Vervaele ◽  
Bert De Roo ◽  
Jolien Debehets ◽  
Marilyne Sousa ◽  
Luman Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silica Thin Films ◽  
Liquid Injection ◽  
Pressure Chemical ◽  
Direct Liquid Injection

Hydrogenation of low-pressure chemical-vapor-deposition silicon thin films

1987 ◽  
Vol 36 (17) ◽  
pp. 9168-9170 ◽  
Author(s):  
P. X. Zhang ◽  
X. W. Wu ◽  
J. Yao ◽  
S. K. Wong ◽  
P. K. John ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Thin Films ◽  
Pressure Chemical

scholarly journals Accessing new 2D semiconductors with optical band gap: synthesis of iron-intercalated titanium diselenide thin films via LPCVD

RSC Advances ◽  
2018 ◽  
Vol 8 (40) ◽  
pp. 22552-22558 ◽  
Author(s):  
Clara Sanchez-Perez ◽  
Caroline E. Knapp ◽  
Ross H. Colman ◽  
Carlos Sotelo-Vazquez ◽  
Raija Oilunkaniemi ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Band Gap ◽  
Vapor Deposition ◽  
Optical Band Gap ◽  
Chemical Vapor ◽  
Single Source ◽  
2D Semiconductors ◽  
Single Source Precursor ◽  
Pressure Chemical

Fe-doped TiSe2 thin-films were synthesized via low pressure chemical vapor deposition (LPCVD) of a single source precursor: [Fe(η5-C5H4Se)2Ti(η5-C5H5)2]2 (1).

Sign in / Sign up

Export Citation Format

Share Document