Deposition of Pr- and Nd-aluminate by Liquid Injection MOCVD and ALD Using Single-Source Heterometallic Alkoxide Precursors

2007 ◽  
Vol 19 (19) ◽  
pp. 4796-4803 ◽  
Author(s):  
Jeffrey M. Gaskell ◽  
Szymon Przybylak ◽  
Anthony C. Jones ◽  
Helen C. Aspinall ◽  
Paul R. Chalker ◽  
...  
Keyword(s):  
Single Source ◽  
Liquid Injection ◽  
Heterometallic Alkoxide ◽  
Alkoxide Precursors

Liquid injection MOCVD and ALD studies of “single source” Sr-Nb and Sr-Ta precursors

2003 ◽  
Vol 784 ◽  
Author(s):  
Richard J. Potter ◽  
Paul A. Marshall ◽  
John L. Roberts ◽  
Anthony C. Jones ◽  
Paul R. Chalker ◽  
...  
Keyword(s):  
Vapour Deposition ◽  
Chemical Vapour ◽  
Atomic Layer ◽  
Single Source ◽  
Layer Deposition ◽  
Liquid Injection ◽  
Metalorganic Chemical Vapour Deposition ◽  
Decomposition Behaviour ◽  
Alkoxide Precursors ◽  
Metalorganic Chemical

ABSTRACTA range of “single source” Sr-Nb and Sr-Ta heterometal alkoxides precursors are investigated as potential sources for liquid injection MOCVD (metalorganic chemical vapour deposition) and ALD (atomic layer deposition) of SrBi2Ta2O9 (SBT) and SrBi2(TxNb1-x)2O9 (SBTN). These “single source” precursors are designed to alleviate the mis-match between conventional Sr and Ta or Sr and Nb sources. Strontium-tantalate and strontium-niobate thin films were deposited on silicon using the “single source” alkoxide precursors [Sr{Ta(OEt)5(dmae}2] and [Sr{Nb(OEt)5(dmae)}2] (dmae = OCH2CH2NMe2), and the optimum temperatures for deposition of stoichiometric SrTa2O6 and SrNb2O6 were determined. Separate ALD studies of [Sr{Ta(OEt)5(dmae)}2] and [Sr{Ta(OEt)5(mee)}2] (mee = OCH2CH2OMe) for the growth of strontium-tantalate were carried out to assess precursor suitability for this technique. Liquid injection MOCVD of Bi-oxide films using Bi(mmp)3 indicates similar decomposition behaviour to the Sr-Ta and Sr-Nb alkoxides, demonstrating its suitability as a complementary source of Bi for SBT, SBN and SBTN.

Deposition of hafnium silicate films by liquid injection MOCVD using a single source or dual source approach

2004 ◽  
Vol 14 (3) ◽  
pp. 391 ◽  
Author(s):  
John L. Roberts ◽  
Paul A. Marshall ◽  
Anthony C. Jones ◽  
Paul R. Chalker ◽  
Jamie F. Bickley ◽  
...  
Keyword(s):  
Single Source ◽  
Hafnium Silicate ◽  
Liquid Injection ◽  
Dual Source

Facile synthesis of highly thermally stable nanoporous γ-aluminas from aluminum alkoxide precursors

RSC Advances ◽  
2015 ◽  
Vol 5 (61) ◽  
pp. 49493-49499 ◽  
Author(s):  
Gholamhossein Mohammadnezhad ◽  
Oluseun Akintola ◽  
Winfried Plass ◽  
Felix H. Schacher ◽  
Frank Steiniger ◽  
...  
Keyword(s):  
Triblock Copolymer ◽  
Sol Gel ◽  
Thermally Stable ◽  
Single Source ◽  
Facile Synthesis ◽  
Single Source Precursors ◽  
Aluminum Alkoxide ◽  
Sol Gel Synthesis ◽  
Alkoxide Precursors

The effects of aluminum alkoxide single source precursors on the sol–gel synthesis of highly thermally stable nanostructured alumina by nonionic triblock copolymer P123 were investigated.

Liquid Injection MOCVD of Rare-Earth Oxides Using New Alkoxide Precursors

2003 ◽  
Vol 784 ◽  
Author(s):  
Paul A. Williams ◽  
Anthony C. Jones ◽  
Helen C. Aspinall ◽  
Jeffrey M. Gaskell ◽  
Paul R. Chalker ◽  
...  
Keyword(s):  
Thin Films ◽  
Rare Earth ◽  
Lanthanum Oxide ◽  
Molecular Aggregation ◽  
Praseodymium Oxide ◽  
H Nmr ◽  
Liquid Injection ◽  
Solution Studies ◽  
Alkoxide Precursors ◽  
Donor Species

ABSTRACTHigh purity lanthanum oxide and praseodymium oxide thin films (C< 1 at.-%) have been deposited by liquid injection MOCVD using the volatile alkoxide precursos [La(mmp)3] and [Pr(mmp)3] in toluene-solution (mmp = OCMe2CH2OMe). 1H NMR solution studies have shown that the addition of donor species, such as tetraglyme (CH3O(CH2CH2O)4CH3) or mmpH prevent molecular aggregation and help stabilise the precursors.

Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors

2005 ◽  
Vol 15 (19) ◽  
pp. 1896 ◽  
Author(s):  
Yim Fun Loo ◽  
Ruairi O'Kane ◽  
Anthony C. Jones ◽  
Helen C. Aspinall ◽  
Richard J. Potter ◽  
...  
Keyword(s):  
Liquid Injection ◽  
Alkoxide Precursors

Synthesis of Ti–Al–Si–N nanocomposite films using liquid injection PECVD from alkoxide precursors

2006 ◽  
Vol 54 (8) ◽  
pp. 2041-2048 ◽  
Author(s):  
Y.S. Li ◽  
S. Shimada ◽  
H. Kiyono ◽  
A. Hirose
Keyword(s):  
Nanocomposite Films ◽  
Liquid Injection ◽  
Alkoxide Precursors
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