Deposition of Titanium−Vanadium Oxide Thin Films on Organic Self-Assembled Monolayers:  Role of Complexing Agents†

2005 ◽  
Vol 17 (22) ◽  
pp. 5550-5557 ◽  
Author(s):  
Jing-Jong Shyue ◽  
Mark R. De Guire
Keyword(s):  
Thin Films ◽  
Vanadium Oxide ◽  
Self Assembled Monolayers ◽  
Complexing Agents ◽  
Oxide Thin Films ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Vanadium Oxide Thin Films ◽  
Titanium Vanadium

Synthesis and Characterization of Titania and Vanadia Thin Films at Organic Self-Assembled Monolayers

1999 ◽  
Vol 576 ◽  
Author(s):  
T. P. Niesen ◽  
J. Wolff ◽  
J. Bill ◽  
M. R. De Guire ◽  
F. Aldinger
Keyword(s):  
Thin Films ◽  
Vanadium Oxide ◽  
Self Assembled Monolayers ◽  
Synthesis And Characterization ◽  
Water Molecules ◽  
Assembled Monolayers ◽  
Titania Films ◽  
Self Assembled ◽  
Deposited Films

ABSTRACTFunctionalized self-assembled monolayers (SAMs) on single-crystal Si wafers have been used as substrates for the deposition of titania and vanadia thin films. The formation of a titanium chelate was used to stabilize an otherwise spontaneously precipitating aqueous titanium solution. Uniform titania films have been synthesized from Ti(O2)2+ in aqueous HCl solutions at 80°C on sulfonated SAMs. Vanadium oxide hydrate films, V2O5·0.7 H2O, have been directly formed from aqueous vanadate solutions on NH2-terminated SAMs at 45°C. In the as-deposited films, water molecules were intercalated between the vanadium oxide layers. Subsequent annealing at 350°C in air led to nanocrystalline V2O5.

Atomic force microscopic studies of oxide thin films on organic self-assembled monolayers

1999 ◽  
Vol 14 (6) ◽  
pp. 2464-2475 ◽  
Author(s):  
T. P. Niesen ◽  
M. R. De Guire ◽  
J. Bill ◽  
F. Aldinger ◽  
M. Rühle ◽  
...  
Keyword(s):  
Thin Films ◽  
Film Growth ◽  
Self Assembled Monolayers ◽  
Oxide Thin Films ◽  
Force Microscopy ◽  
Atomic Force ◽  
Assembled Monolayers ◽  
Microscopic Studies ◽  
Self Assembled ◽  
Attachment Mechanism

The surface morphology of TiO2- and ZrO2-based thin films, deposited from aqueous solution at 70–80 °C onto functionalized organic self-assembled monolayers (SAMs) on silicon has been examined using atomic force microscopy (AFM). The films have been previously shown to consist, respectively, of nanocrystalline TiO2 (anatase) and of nanocrystalline tetragonal ZrO2 with amorphous basic zirconium sulfate. The films exhibit characteristic surface roughnesses on two length scales. Roughness on the nanometer scale appears to be dictated by the size of the crystallites in the film. Roughness on the micron scale is postulated to be related to several factors, including the topography of the SAM and the effects of larger, physisorbed particles or agglomerates. The topographies of the oxide thin films, on both the nanometer and micron scales, are consistent with a particle-attachment mechanism of film growth.

Investigation of hexadecanethiol self-assembled monolayers on cadmium tin oxide thin films

2008 ◽  
Vol 516 (8) ◽  
pp. 1838-1842 ◽  
Author(s):  
Crissy L. Rhodes ◽  
Scott H. Brewer ◽  
Jaap Folmer ◽  
Stefan Franzen
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Self Assembled Monolayers ◽  
Oxide Thin Films ◽  
Assembled Monolayers ◽  
Self Assembled

Deposition of oxide thin films on silicon using organic self-assembled monolayers

1996 ◽  
Author(s):  
Mark R. DeGuire ◽  
Hyunjung Shin ◽  
R. J. Collins ◽  
Monika Agarwal ◽  
Chaim N. Sukenik ◽  
...  
Keyword(s):  
Thin Films ◽  
Self Assembled Monolayers ◽  
Oxide Thin Films ◽  
Assembled Monolayers ◽  
Self Assembled
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