Deposition of Vanadium(V) Oxide Thin Films on Nitrogen-Containing Self-Assembled Monolayers†

2005 ◽  
Vol 17 (4) ◽  
pp. 787-794 ◽  
Author(s):  
Jing-Jong Shyue ◽  
Mark R. De Guire
Keyword(s):  
Thin Films ◽  
Self Assembled Monolayers ◽  
Oxide Thin Films ◽  
Assembled Monolayers ◽  
Self Assembled

Atomic force microscopic studies of oxide thin films on organic self-assembled monolayers

1999 ◽  
Vol 14 (6) ◽  
pp. 2464-2475 ◽  
Author(s):  
T. P. Niesen ◽  
M. R. De Guire ◽  
J. Bill ◽  
F. Aldinger ◽  
M. Rühle ◽  
...  
Keyword(s):  
Thin Films ◽  
Film Growth ◽  
Self Assembled Monolayers ◽  
Oxide Thin Films ◽  
Force Microscopy ◽  
Atomic Force ◽  
Assembled Monolayers ◽  
Microscopic Studies ◽  
Self Assembled ◽  
Attachment Mechanism

The surface morphology of TiO2- and ZrO2-based thin films, deposited from aqueous solution at 70–80 °C onto functionalized organic self-assembled monolayers (SAMs) on silicon has been examined using atomic force microscopy (AFM). The films have been previously shown to consist, respectively, of nanocrystalline TiO2 (anatase) and of nanocrystalline tetragonal ZrO2 with amorphous basic zirconium sulfate. The films exhibit characteristic surface roughnesses on two length scales. Roughness on the nanometer scale appears to be dictated by the size of the crystallites in the film. Roughness on the micron scale is postulated to be related to several factors, including the topography of the SAM and the effects of larger, physisorbed particles or agglomerates. The topographies of the oxide thin films, on both the nanometer and micron scales, are consistent with a particle-attachment mechanism of film growth.

Investigation of hexadecanethiol self-assembled monolayers on cadmium tin oxide thin films

2008 ◽  
Vol 516 (8) ◽  
pp. 1838-1842 ◽  
Author(s):  
Crissy L. Rhodes ◽  
Scott H. Brewer ◽  
Jaap Folmer ◽  
Stefan Franzen
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Self Assembled Monolayers ◽  
Oxide Thin Films ◽  
Assembled Monolayers ◽  
Self Assembled

Deposition of oxide thin films on silicon using organic self-assembled monolayers

1996 ◽  
Author(s):  
Mark R. DeGuire ◽  
Hyunjung Shin ◽  
R. J. Collins ◽  
Monika Agarwal ◽  
Chaim N. Sukenik ◽  
...  
Keyword(s):  
Thin Films ◽  
Self Assembled Monolayers ◽  
Oxide Thin Films ◽  
Assembled Monolayers ◽  
Self Assembled

Self-assembled Monolayers Preparation and Characterization of BiFeO3 Thin Films

2009 ◽  
Vol 25 (1) ◽  
pp. 83-86 ◽  
Author(s):  
Guo-Qiang TAN ◽  
Hai-Yang BO ◽  
Hong-Yan MIAO ◽  
Ao XIA ◽  
Zhong-Liang HE
Keyword(s):  
Thin Films ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled

Nanoporous Thin Films Formed from Photocleavable Diblock Copolymers on Gold Substrates Modified with Thiolate Self-Assembled Monolayers

Langmuir ◽  
2020 ◽  
Vol 36 (31) ◽  
pp. 9259-9268 ◽  
Author(s):  
Takashi Ito ◽  
Herman Coceancigh ◽  
Yi Yi ◽  
Jay N. Sharma ◽  
Fred C. Parks ◽  
...  
Keyword(s):  
Thin Films ◽  
Diblock Copolymers ◽  
Self Assembled Monolayers ◽  
Gold Substrates ◽  
Assembled Monolayers ◽  
Self Assembled

Formation and stability of porphyrin and phthalocyanine self-assembled monolayers on ZnO surfaces

2016 ◽  
Vol 20 (08n11) ◽  
pp. 1264-1271 ◽  
Author(s):  
Hanna Hakola ◽  
Essi Sariola-Leikas ◽  
Paavo Jäntti ◽  
Thomas Mokus ◽  
Kati Stranius ◽  
...  
Keyword(s):  
Thin Films ◽  
Zno Nanorods ◽  
Self Assembled Monolayers ◽  
Layer Formation ◽  
Zno Film ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Anchoring Groups ◽  
The Stability ◽  
Phosphate Groups

Formation of self-assembled monolayers (SAMs) of three porphyrin and one phthalocyanine derivatives on thin ZnO film was studied by monitoring absorption spectra of the samples. The compounds were equipped with carboxylic or phosphate groups to bind to the surface. The SAM formation was found to be fast. The layer was formed in less than 15 min for all studied porphyrins, and 30 min was sufficient to form phthalocyanine layer. For porphyrins with different anchor groups the SAM formation was too fast to see any difference between the anchoring groups. The stability of SAMs was tested then by immersing the samples into neat solvents. Upon immersion the SAMs were gradually losing the absorbance for all the compounds with degradation trends being in line with p[Formula: see text] values of the binding groups of the same type. However, even for the weakest binding group the SAM was relatively stable after a few tens of minutes of washing, which was sufficient to remove physisorbed compounds but the SAM was essentially not destroyed. Comparison of SAMs on thin films with SAMs on ZnO nanorods and TiO2 nanoparticle films indicated the same fast layer formation but relatively weaker SAMs stability, showing 20–40% faster absorption losses during the washing.

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