Single-Source Chemical Vapor Deposition Growth of ZnO Thin Films Using Zn4O(CO2NEt2)6

2002 ◽  
Vol 14 (10) ◽  
pp. 4339-4342 ◽  
Author(s):  
A. J. Petrella ◽  
H. Deng ◽  
N. K. Roberts ◽  
R. N. Lamb
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Zno Thin Films ◽  
Single Source ◽  
Chemical Vapor Deposition Growth

Plasma-assisted metalorganic chemical vapor deposition growth of ZnO thin films

2006 ◽  
Vol 21 (7) ◽  
pp. 1632-1637 ◽  
Author(s):  
Maria Losurdo ◽  
Maria M. Giangregorio ◽  
A. Sacchetti ◽  
Pio Capezzuto ◽  
Giovanni Bruno ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Zno Thin Films ◽  
Zno Films ◽  
Chemical Vapor Deposition Growth ◽  
Metalorganic Chemical

ZnO thin films have been grown by metalorganic chemical vapor deposition (MOCVD) and plasma-assisted (PA) MOCVD on c-axis-oriented sapphire (0001) and Si (001) substrates using the novel Zn(2-thenoyltrifluoroacetonate)2·N,N,N′,N′-tetramethylethylendiamine precursor. The structural, morphological, and optical properties of ZnO films have been investigated. The results show that the O2 PA growth results in highly c-axis-oriented hexagonal ZnO thin films also on cubic substrates. PA-MOCVD ZnO films have good optical properties, as inferred by the presence of a sharp and intense exciton in the dielectric function.

Microstructure control of ZnO thin films prepared by single source chemical vapor deposition

2004 ◽  
Vol 458 (1-2) ◽  
pp. 43-46 ◽  
Author(s):  
H. Deng ◽  
J.J. Russell ◽  
R.N. Lamb ◽  
B. Jiang ◽  
Y. Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Zno Thin Films ◽  
Single Source ◽  
Microstructure Control

Preparation of ZnO Thin Films Deposited by Plasma Chemical Vapor Deposition for Application to Ultraviolet-cut Coating

2001 ◽  
Vol 40 (Part 1, No. 10) ◽  
pp. 6099-6103 ◽  
Author(s):  
Hidetaka Anma ◽  
Yuuji Yoshimoto ◽  
Mariko Tanaka ◽  
Hiroyuki Takatsuka ◽  
Yoshinori Hatanaka
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Zno Thin Films ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

Hafnium diboride thin films by chemical vapor deposition from a single source precursor

2005 ◽  
Vol 23 (6) ◽  
pp. 1619-1625 ◽  
Author(s):  
Sreenivas Jayaraman ◽  
Yu Yang ◽  
Do Young Kim ◽  
Gregory S. Girolami ◽  
John R. Abelson
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Single Source ◽  
Hafnium Diboride ◽  
Single Source Precursor
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